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  • Silicon nanocrystals were prepared by Si+-ion implantation and subswquent annealing of SiO2 films thermally grown on a c-Si wafer. It is shown that all PL characteristics (eficiency, dynamics, temperature dependence, excitaqtion spectra) of the Si+-implanted SiO2 films bear close resemblance to those of a light-emitting porous Si and therefore are supposed similar PL origin in both materials.
  • Silicon nanocrystals were prepared by Si+-ion implantation and subswquent annealing of SiO2 films thermally grown on a c-Si wafer. It is shown that all PL characteristics (eficiency, dynamics, temperature dependence, excitaqtion spectra) of the Si+-implanted SiO2 films bear close resemblance to those of a light-emitting porous Si and therefore are supposed similar PL origin in both materials. (en)
Title
  • Temperature behavior of optical properties of Si + - implanted SiO 2 .
  • Temperature behavior of optical properties of Si + - implanted SiO 2 . (en)
skos:prefLabel
  • Temperature behavior of optical properties of Si + - implanted SiO 2 .
  • Temperature behavior of optical properties of Si + - implanted SiO 2 . (en)
skos:notation
  • RIV/68378271:_____/00:02000032!RIV/2003/AV0/A02003/N
http://linked.open.../vavai/riv/strany
  • 395;398
http://linked.open...avai/riv/aktivita
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  • P(GA202/98/0669), P(IAA1010809), P(IAB1112901), Z(AV0Z1010914)
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  • N/A
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  • 728999
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  • RIV/68378271:_____/00:02000032
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  • N/A (en)
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  • DE - Spolková republika Německo
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  • [9FAF561C2F7C]
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  • European Physical Journal. D
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  • 8
http://linked.open...iv/tvurceVysledku
  • Nikl, Martin
  • Valenta, J.
  • Pelant, Ivan
  • Hönerlage, B.
  • Muller, D.
  • Dian, J.
  • Luterová, Kateřina
  • Rehspringer, J. L.
  • Knápek, Petr
  • Grob, J. J.
http://linked.open...n/vavai/riv/zamer
issn
  • 1434-6060
number of pages
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