About: Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam

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About: Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	One of the main goals in e-beam lithography is to increase exposure speed to achieve higher throughput. There are basically two types of electron-beam writers, shaped beam lithography systems and Gaussian beam lithography systems. The exposure time of both e-beam writers consist in essence of beam-on time, deflection system stabilization time and stage movement time. Exposure time testing was carried out on two types of patterns. There were completely filled in areas, binary period gratings (ratio 1:1 between exposed and unexposed areas), and multileveled structures (computer generated holograms). Exposures data was prepared according to standard technology (PMMA resist, exposure dose, non-alcoholic based developer) for both systems. The result of experiment shows that variable shaped beam system has advantage in multileveled structures while the Gaussian beam system is more suitable for gratings type of pattern. It was proved that combination of both systems has its use to increase exposures throughput. One of the main goals in e-beam lithography is to increase exposure speed to achieve higher throughput. There are basically two types of electron-beam writers, shaped beam lithography systems and Gaussian beam lithography systems. The exposure time of both e-beam writers consist in essence of beam-on time, deflection system stabilization time and stage movement time. Exposure time testing was carried out on two types of patterns. There were completely filled in areas, binary period gratings (ratio 1:1 between exposed and unexposed areas), and multileveled structures (computer generated holograms). Exposures data was prepared according to standard technology (PMMA resist, exposure dose, non-alcoholic based developer) for both systems. The result of experiment shows that variable shaped beam system has advantage in multileveled structures while the Gaussian beam system is more suitable for gratings type of pattern. It was proved that combination of both systems has its use to increase exposures throughput. (en)
Title	Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam (en)
skos:prefLabel	Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam Exposure Time Comparison between E-beam Writer with Gaussian Beam and Variable Shaped Beam (en)
skos:notation	RIV/68081731:_____/14:00437838!RIV15-TA0-68081731
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED0017/01/01), P(LO1212), P(TE01020118)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Meluzín, Petr Horáček, Miroslav Kolařík, Vladimír Matějka, Milan Urbánek, Michal Krátký, Stanislav Chlumská, Jana
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	16130
http://linked.open...ai/riv/idVysledku	RIV/68081731:_____/14:00437838
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	e-beam writer; Gaussian beam; variable shaped beam (en)
http://linked.open.../riv/klicoveSlovo	Gaussian beam e-beam writer variable shaped beam
http://linked.open...ontrolniKodProRIV	[6258138B2DD9]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Ostrava
http://linked.open...i/riv/nazevZdroje	NANOCON 2014. 6th International conference proceedings
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	ALISI - Centre of advanced diagnostic methods and technologies Electron microscopy APPLICATION LABORATORIES OF ADVANCED MICROTECHNOLOGIES AND NANOTECHNOLOGIES
http://linked.open...UplatneniVysledku	2014
http://linked.open...iv/tvurceVysledku	Horáček, Miroslav Matějka, Milan Urbánek, Michal Kolařík, Vladimír Krátký, Stanislav Chlumská, Jana Meluzín, Petr
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2014-11-05 (xsd:date)
number of pages	5 (xsd:int)
http://purl.org/ne...btex#hasPublisher	TANGER
https://schema.org/isbn	978-80-87294-55-0

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