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  • Two main factors can lead to losing adhesion in thin sputtered carbon nitride films: high residual stress and absorption of humidity. Basically, two different types of stress can be identified in thin films: compressive stress and tensile stress. Compressive stress can lead to wrinkling and film delamination, and tensile stress can cause the fracturing of thin films. For reactive sputtering of hydrogenated carbon nitride films, the compressive stress is typical. The films were prepared from graphite target (high purity, 99.9999 %) in mixture of nitrogen and hydrogen discharge.
  • Two main factors can lead to losing adhesion in thin sputtered carbon nitride films: high residual stress and absorption of humidity. Basically, two different types of stress can be identified in thin films: compressive stress and tensile stress. Compressive stress can lead to wrinkling and film delamination, and tensile stress can cause the fracturing of thin films. For reactive sputtering of hydrogenated carbon nitride films, the compressive stress is typical. The films were prepared from graphite target (high purity, 99.9999 %) in mixture of nitrogen and hydrogen discharge. (en)
Title
  • Observation of high stressed hydrogenated carbon nitride films by SLEEM
  • Observation of high stressed hydrogenated carbon nitride films by SLEEM (en)
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  • Observation of high stressed hydrogenated carbon nitride films by SLEEM
  • Observation of high stressed hydrogenated carbon nitride films by SLEEM (en)
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  • RIV/68081731:_____/12:00386392!RIV13-AV0-68081731
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  • 155532
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  • RIV/68081731:_____/12:00386392
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  • SLEEM; hydrogenated carbon nitride films (en)
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  • [B5A35FE0806E]
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  • Brno
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  • Proceedings of the 13th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation
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  • Sobota, Jaroslav
  • Mikmeková, Eliška
  • Müllerová, Ilona
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number of pages
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  • Institute of Scientific Instruments AS CR, v.v.i
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  • 978-80-87441-07-7
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