About: Optical characterization of HfO(2) thin films

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail. Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail. (en)
Title	Optical characterization of HfO(2) thin films Optical characterization of HfO(2) thin films (en)
skos:prefLabel	Optical characterization of HfO(2) thin films Optical characterization of HfO(2) thin films (en)
skos:notation	RIV/68081731:_____/11:00365941!RIV12-AV0-68081731
http://linked.open...avai/riv/aktivita	I Z
http://linked.open...avai/riv/aktivity	I, Z(AV0Z20650511), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	18
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Pokorný, Pavel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	218529
http://linked.open...ai/riv/idVysledku	RIV/68081731:_____/11:00365941
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	optical properties; ellipsometry; spectrophotometry; hafnium oxide; transition-metal oxide; Urbach tail (en)
http://linked.open.../riv/klicoveSlovo	ellipsometry Urbach tail hafnium oxide transition-metal oxide optical properties spectrophotometry
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[93F36677BA98]
http://linked.open...i/riv/nazevZdroje	Thin Solid Films
http://linked.open...in/vavai/riv/obor	JK
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	519
http://linked.open...iv/tvurceVysledku	Pokorný, Pavel Franta, D. Nečas, D. Caha, O. Hasoň, M. Ohlídal, I. Vižďa, F.
http://linked.open...ain/vavai/riv/wos	000292576500042
http://linked.open...n/vavai/riv/zamer	Research into experimental methods for examination of the physical properties of matter and their application in advanced technologies Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0040-6090
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.tsf.2011.03.128

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