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  • Mapping of the p-type dopant in an n-type silicon substrate was studied on a planar structure composed of variously sized doped patterns of various dopant densities. The traditional imaging by means of secondary electrons and its quantifiability was verified and the method was extended to the very low energy range.
  • Mapping of the p-type dopant in an n-type silicon substrate was studied on a planar structure composed of variously sized doped patterns of various dopant densities. The traditional imaging by means of secondary electrons and its quantifiability was verified and the method was extended to the very low energy range. (en)
Title
  • Mapping of Dopants in Silicon by Injection of Electrons
  • Mapping of Dopants in Silicon by Injection of Electrons (en)
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  • Mapping of Dopants in Silicon by Injection of Electrons
  • Mapping of Dopants in Silicon by Injection of Electrons (en)
skos:notation
  • RIV/68081731:_____/10:00352508!RIV11-AV0-68081731
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  • Z(AV0Z20650511)
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  • 269637
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  • RIV/68081731:_____/10:00352508
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  • semiconductors; dopant contrast; very low energy SEM (en)
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  • [6D370245780D]
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  • Toyama
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  • Toyama
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  • Proceedings of 5th Japan-China-Norway Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology
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  • Hovorka, Miloš
  • Frank, Luděk
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number of pages
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  • University of Toyama
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  • 978-4-9903248-2-7
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