About: Characterization of the boundaries of thin films of TiO.sub.2./sub. by atomic force microscopy and optical methods.     Goto   Sponge   NotDistinct   Permalink

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  • In this paper slight roughness of the upper boundaries of TiO.sub.2./sub.thin films prepared on substrates formed by single-crystal silicon in studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopicreflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quitestrongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO.sub.2./sub. films exhibit an inhomogeneity represented by a profile of the complex refractive index.
  • In this paper slight roughness of the upper boundaries of TiO.sub.2./sub.thin films prepared on substrates formed by single-crystal silicon in studied. Atomic force microscopy (AFM) and an optical method based on combining variable-angle spectroscopic ellipsometry and near-normal spectroscopicreflectometry are used for this purpose. It is shown that the values of the basic statistical quantities characterizing this roughness depend quitestrongly on the values of the thicknesses of these films (they increase with increasing thickness). Differences observed between the values of the basic statistical parameters determined by AFM and the optical method are explained. It is also shown that the TiO.sub.2./sub. films exhibit an inhomogeneity represented by a profile of the complex refractive index. (en)
Title
  • Characterization of the boundaries of thin films of TiO.sub.2./sub. by atomic force microscopy and optical methods.
  • Characterization of the boundaries of thin films of TiO.sub.2./sub. by atomic force microscopy and optical methods. (en)
skos:prefLabel
  • Characterization of the boundaries of thin films of TiO.sub.2./sub. by atomic force microscopy and optical methods.
  • Characterization of the boundaries of thin films of TiO.sub.2./sub. by atomic force microscopy and optical methods. (en)
skos:notation
  • RIV/68081731:_____/02:12020071!RIV/2003/AV0/A12003/N
http://linked.open.../vavai/riv/strany
  • 759 ; 762
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  • P(GA101/01/1104), Z(AV0Z2065902)
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  • N/A
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  • 640652
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  • RIV/68081731:_____/02:12020071
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  • optical characterization; TiO.sub.2./sub. thin films; bonduary roughness (en)
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  • GB - Spojené království Velké Británie a Severního Irska
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  • [AFA0315BAF01]
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  • Surface and interface analysis
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  • 34
http://linked.open...iv/tvurceVysledku
  • Klapetek, P.
  • Pokorný, Pavel
  • Franta, D.
  • Ohlídal, I.
http://linked.open...n/vavai/riv/zamer
issn
  • 0142-2421
number of pages
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