About: Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays

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About: Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	A novel nanofabrication technique based on 4-beam interference lithography is presented that enables the preparation of large macroscopic areas (>50 mm2) of perfectly periodic and defect-free two-dimensional plasmonic arrays of nanoparticles as small as 100 nm. The technique is based on a special interferometer, composed of two mirrors and a sample with photoresist that together form a right-angled corner reflector. In such an interferometer, the incoming expanded laser beam is split into four interfering beams that yield an interference pattern with rectangular symmetry. The interferometer allows setting the periods of the array from about 220 nm to 1500 nm in both directions independently through the rotation of the corner-reflector assembly around horizontal and vertical axes perpendicular to the direction of the incident beam. Using a theoretical model, the implementation of the four-beam interference lithography is discussed in terms of the optimum contrast as well as attainable periods of the array. Several examples of plasmonic arrays (on either glass or polymer substrate layers) fabricated by this technique are presented A novel nanofabrication technique based on 4-beam interference lithography is presented that enables the preparation of large macroscopic areas (>50 mm2) of perfectly periodic and defect-free two-dimensional plasmonic arrays of nanoparticles as small as 100 nm. The technique is based on a special interferometer, composed of two mirrors and a sample with photoresist that together form a right-angled corner reflector. In such an interferometer, the incoming expanded laser beam is split into four interfering beams that yield an interference pattern with rectangular symmetry. The interferometer allows setting the periods of the array from about 220 nm to 1500 nm in both directions independently through the rotation of the corner-reflector assembly around horizontal and vertical axes perpendicular to the direction of the incident beam. Using a theoretical model, the implementation of the four-beam interference lithography is discussed in terms of the optimum contrast as well as attainable periods of the array. Several examples of plasmonic arrays (on either glass or polymer substrate layers) fabricated by this technique are presented (en)
Title	Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays (en)
skos:prefLabel	Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays (en)
skos:notation	RIV/67985882:_____/14:00436364!RIV15-GA0-67985882
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(GBP205/12/G118)
http://linked.open...iv/cisloPeriodika	15
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Homola, Jiří Vala, Milan
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav fotoniky a elektroniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	17031
http://linked.open...ai/riv/idVysledku	RIV/67985882:_____/14:00436364
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Interference lithography; Polymer substrate; Four-beam interference (en)
http://linked.open.../riv/klicoveSlovo	Four-beam interference Interference lithography Polymer substrate
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[0F22D424B791]
http://linked.open...i/riv/nazevZdroje	Optics Express
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanobiophotonics for future health care
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	22
http://linked.open...iv/tvurceVysledku	Homola, Jiří Vala, Milan
http://linked.open...ain/vavai/riv/wos	000340685600116
issn	1094-4087
number of pages	12 (xsd:int)
http://bibframe.org/vocab/doi	10.1364/OE.22.018778

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