About: Structural and optical characterization of thick InN epitaxial layers grown with a single or two step growth process on GaN(0001)     Goto   Sponge   NotDistinct   Permalink

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Description
  • Transmisní elektronová mikroskopie, Ramanova spektroskopie a fotoluminisce byly využity pro srovnání strukturních a optických vlastností vrstev InN vypěstovaných metodou MBE na podložkách on GaN/Al2O3 (0001) s využitím jednostupňového nebo dvoustupňového procesu růstu. Dvoustupňovy proces vede k lepší strukturní a optické vlastnosti. Rozdíl ve fotoluminiscenčních spektrech mezi vzorky získanými jednostupňovým a dvoustupňovým procesem růstu je důkazem rozdílu koncentrací elektronů v obou typech vrstev. (cs)
  • Transmision electron microscopy, Raman spectroscopy and photoluminescence are employed to compare the structural and optical properties of compact InN films grown by molecular beam epitaxy on GaN/Al2O3 (0001) with single strp or two-step growth process. The two-step films exhibit better strucutural and optical properties as indicated by sharper InN/GaN interface. The PL emssion peak difference between single and double step grown samples provide evidence for different carrier concentrations.
  • Transmision electron microscopy, Raman spectroscopy and photoluminescence are employed to compare the structural and optical properties of compact InN films grown by molecular beam epitaxy on GaN/Al2O3 (0001) with single strp or two-step growth process. The two-step films exhibit better strucutural and optical properties as indicated by sharper InN/GaN interface. The PL emssion peak difference between single and double step grown samples provide evidence for different carrier concentrations. (en)
Title
  • Structural and optical characterization of thick InN epitaxial layers grown with a single or two step growth process on GaN(0001)
  • Strukturní a optická charakterizace tlustých epitaxních vrstev InN vypěstovaných na povrchu GaN(0001) pomocí jednostupňového nebo dvoustupňového procesu růstu (cs)
  • Structural and optical characterization of thick InN epitaxial layers grown with a single or two step growth process on GaN(0001) (en)
skos:prefLabel
  • Structural and optical characterization of thick InN epitaxial layers grown with a single or two step growth process on GaN(0001)
  • Strukturní a optická charakterizace tlustých epitaxních vrstev InN vypěstovaných na povrchu GaN(0001) pomocí jednostupňového nebo dvoustupňového procesu růstu (cs)
  • Structural and optical characterization of thick InN epitaxial layers grown with a single or two step growth process on GaN(0001) (en)
skos:notation
  • RIV/67985882:_____/06:00043973!RIV07-AV0-67985882
http://linked.open.../vavai/riv/strany
  • 162;166
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(KSK1010601), P(ME 697), Z(AV0Z20670512)
http://linked.open...iv/cisloPeriodika
  • 1
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 501910
http://linked.open...ai/riv/idVysledku
  • RIV/67985882:_____/06:00043973
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • semiconductor materials; interface structure; photoluminescence (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [AC51781F43B4]
http://linked.open...i/riv/nazevZdroje
  • Physica Status Solidi. A
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 203
http://linked.open...iv/tvurceVysledku
  • Gladkov, Petr
  • Arvanitidis, J.
  • Kehagias, Th.
  • Komninou, Ph.
  • Delimitis, A.
  • Dimakis, E.
  • Georgakilas, A.
  • Katsikini, M.
  • Ves, S.
http://linked.open...n/vavai/riv/zamer
issn
  • 0031-8965
number of pages
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