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  • Použitelnost modelu růstu krystalů autorů Burtona, Cabrery a Franka je v případě LPE růstu tlustých polovodičových vrstev omezena objemovou difůzí atomů. Tento jev může být respektován zavedením záporné korekce k přesycení, která je funkcí rychlosti růstu. Výsledný implicitní nelineární problém je řešen pomocí metody kauzálních diagramů. Teoretické předpovědi jsou konfrontovány s experimentálními daty, vztahujícími se k růstu tlustých vrstev InP a InP:Nd. (cs)
  • Applicability of the Burton-Cabrera-Frank model of crystal growth is limited in the case of LPE preparation of thick semiconductor layers due to volume diffusion of constituent atoms. This phenomenon can be accounted for by introducing negative growth-rate dependent correction to supersaturation. The resulting implicit nonlinear problem is solved using the technique of causal diagrams. Theoretical predictions are confronted with experimental data on the growth of thick InP and InP:Nd layers.
  • Applicability of the Burton-Cabrera-Frank model of crystal growth is limited in the case of LPE preparation of thick semiconductor layers due to volume diffusion of constituent atoms. This phenomenon can be accounted for by introducing negative growth-rate dependent correction to supersaturation. The resulting implicit nonlinear problem is solved using the technique of causal diagrams. Theoretical predictions are confronted with experimental data on the growth of thick InP and InP:Nd layers. (en)
Title
  • Growth kinetics of thick InP layers
  • Growth kinetics of thick InP layers (en)
  • Kinetika růstu tlustých vrstev InP (cs)
skos:prefLabel
  • Growth kinetics of thick InP layers
  • Growth kinetics of thick InP layers (en)
  • Kinetika růstu tlustých vrstev InP (cs)
skos:notation
  • RIV/67985882:_____/04:00105913!RIV/2005/GA0/A13005/N
http://linked.open.../vavai/riv/strany
  • 65;69
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA102/03/0379), P(KSK1010104)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 565823
http://linked.open...ai/riv/idVysledku
  • RIV/67985882:_____/04:00105913
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • epitaxial growth;epitaxial layers;nonlinear systems (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [5FF1ECD7837C]
http://linked.open...v/mistoKonaniAkce
  • Smolenice
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  • Piscataway
http://linked.open...i/riv/nazevZdroje
  • ASDAM'2004. Proceedings of the Fifth International Conference on Advanced Semiconductor Devices and Microsystems
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Procházková, Olga
  • Šrobár, Fedor
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
number of pages
http://purl.org/ne...btex#hasPublisher
  • IEEE
https://schema.org/isbn
  • 0-7803-8535-7
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