Attributes | Values |
---|
rdf:type
| |
Description
| - Thin sol-gel TiO2 layers deposited on the conductive ITO glass by means of three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as electrochemical cell. The thin TiO2 films were treated at 450° C and after calcination all samples possessed the crystallographic form of anatase. The relationship between surface structure and photo-induced conductivity of the nanostructured layers was investigated. It was found that the used deposition method significantly influenced the structural properties of prepared layers; mainly, the formation of defects and their quantity in the prepared films. The surface properties of the calcined layers were determined by XRD, Raman spectroscopy, SEM, AFM, UV-Vis analyses and by the optical microscopy. The photo-induced properties of nanoparticulate TiO2/ITO photoanode were studied by electrochemical measurements combined with UV irradiation.
- Thin sol-gel TiO2 layers deposited on the conductive ITO glass by means of three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as electrochemical cell. The thin TiO2 films were treated at 450° C and after calcination all samples possessed the crystallographic form of anatase. The relationship between surface structure and photo-induced conductivity of the nanostructured layers was investigated. It was found that the used deposition method significantly influenced the structural properties of prepared layers; mainly, the formation of defects and their quantity in the prepared films. The surface properties of the calcined layers were determined by XRD, Raman spectroscopy, SEM, AFM, UV-Vis analyses and by the optical microscopy. The photo-induced properties of nanoparticulate TiO2/ITO photoanode were studied by electrochemical measurements combined with UV irradiation. (en)
|
Title
| - The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil
- The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil (en)
|
skos:prefLabel
| - The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil
- The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil (en)
|
skos:notation
| - RIV/67985858:_____/13:00390196!RIV13-AV0-67985858
|
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| |
http://linked.open...iv/cisloPeriodika
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/67985858:_____/13:00390196
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - titanium dioxide; photoelectrochemical properties; deposition techniques (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...odStatuVydavatele
| - US - Spojené státy americké
|
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...i/riv/nazevZdroje
| - Journal of Sol-Gel Science and Technology
|
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...v/svazekPeriodika
| |
http://linked.open...iv/tvurceVysledku
| - Krýsa, J.
- Klusoň, Petr
- Šolcová, Olga
- Veselý, M.
- Morozová, Magdalena
- Dzik, P.
- Baudyš, M.
|
http://linked.open...ain/vavai/riv/wos
| |
issn
| |
number of pages
| |
http://bibframe.org/vocab/doi
| - 10.1007/s10971-012-2957-6
|