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  • Thin sol-gel TiO2 layers deposited on the conductive ITO glass by means of three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as electrochemical cell. The thin TiO2 films were treated at 450° C and after calcination all samples possessed the crystallographic form of anatase. The relationship between surface structure and photo-induced conductivity of the nanostructured layers was investigated. It was found that the used deposition method significantly influenced the structural properties of prepared layers; mainly, the formation of defects and their quantity in the prepared films. The surface properties of the calcined layers were determined by XRD, Raman spectroscopy, SEM, AFM, UV-Vis analyses and by the optical microscopy. The photo-induced properties of nanoparticulate TiO2/ITO photoanode were studied by electrochemical measurements combined with UV irradiation.
  • Thin sol-gel TiO2 layers deposited on the conductive ITO glass by means of three various deposition techniques (dip-coating, inkjet printing and spray-coating) were used as electrochemical cell. The thin TiO2 films were treated at 450° C and after calcination all samples possessed the crystallographic form of anatase. The relationship between surface structure and photo-induced conductivity of the nanostructured layers was investigated. It was found that the used deposition method significantly influenced the structural properties of prepared layers; mainly, the formation of defects and their quantity in the prepared films. The surface properties of the calcined layers were determined by XRD, Raman spectroscopy, SEM, AFM, UV-Vis analyses and by the optical microscopy. The photo-induced properties of nanoparticulate TiO2/ITO photoanode were studied by electrochemical measurements combined with UV irradiation. (en)
Title
  • The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil
  • The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil (en)
skos:prefLabel
  • The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil
  • The Influence of Various Deposition Techniques on the Photoelectrochemical Properties of the Titanium Dioxide Thin Fil (en)
skos:notation
  • RIV/67985858:_____/13:00390196!RIV13-AV0-67985858
http://linked.open...avai/riv/aktivita
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  • I, P(TA01020804)
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  • 3
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  • 80042
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  • RIV/67985858:_____/13:00390196
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  • titanium dioxide; photoelectrochemical properties; deposition techniques (en)
http://linked.open.../riv/klicoveSlovo
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  • US - Spojené státy americké
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  • [31540FEED05C]
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  • Journal of Sol-Gel Science and Technology
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  • 65
http://linked.open...iv/tvurceVysledku
  • Krýsa, J.
  • Klusoň, Petr
  • Šolcová, Olga
  • Veselý, M.
  • Morozová, Magdalena
  • Dzik, P.
  • Baudyš, M.
http://linked.open...ain/vavai/riv/wos
  • 000315628200022
issn
  • 0928-0707
number of pages
http://bibframe.org/vocab/doi
  • 10.1007/s10971-012-2957-6
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