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rdf:type
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Description
| - UV laser-irradiation of gaseous mixture of dimethyl tellurium and 1,3-disilacyclobutane induces concurrent photolysis of both compounds. Chemical changes taking place are due to expulsion of elemental tellurium from dimethyl tellurium and formation of short-lived and fast polymerizing silene from of 1,3-disilacyclobutane. The co-photolysis process results in chemical vapour co-deposition of nanosized tellurium/polycarbosilane composite that contains amorphous nano-structures of tellurium stabilized against oxidation by organosilicon polymer.
- UV laser-irradiation of gaseous mixture of dimethyl tellurium and 1,3-disilacyclobutane induces concurrent photolysis of both compounds. Chemical changes taking place are due to expulsion of elemental tellurium from dimethyl tellurium and formation of short-lived and fast polymerizing silene from of 1,3-disilacyclobutane. The co-photolysis process results in chemical vapour co-deposition of nanosized tellurium/polycarbosilane composite that contains amorphous nano-structures of tellurium stabilized against oxidation by organosilicon polymer. (en)
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Title
| - Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process.
- Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process. (en)
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skos:prefLabel
| - Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process.
- Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process. (en)
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skos:notation
| - RIV/67985858:_____/03:27030014!RIV/2004/AV0/A27004/N
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(IAA4072107), Z(AV0Z4032918), Z(AV0Z4040901), Z(AV0Z4072921)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/67985858:_____/03:27030014
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - tellurium film; polymer-stabilization; chemical vapour deposition (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Journal of Materials Chemistry
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...ocetUcastnikuAkce
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http://linked.open...nichUcastnikuAkce
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Pola, Josef
- Šubrt, Jan
- Urbanová, Markéta
- Bastl, Zdeněk
- Bakardjieva, S.
- Volnina, E. A.
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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