About: Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process.     Goto   Sponge   NotDistinct   Permalink

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Description
  • UV laser-irradiation of gaseous mixture of dimethyl tellurium and 1,3-disilacyclobutane induces concurrent photolysis of both compounds. Chemical changes taking place are due to expulsion of elemental tellurium from dimethyl tellurium and formation of short-lived and fast polymerizing silene from of 1,3-disilacyclobutane. The co-photolysis process results in chemical vapour co-deposition of nanosized tellurium/polycarbosilane composite that contains amorphous nano-structures of tellurium stabilized against oxidation by organosilicon polymer.
  • UV laser-irradiation of gaseous mixture of dimethyl tellurium and 1,3-disilacyclobutane induces concurrent photolysis of both compounds. Chemical changes taking place are due to expulsion of elemental tellurium from dimethyl tellurium and formation of short-lived and fast polymerizing silene from of 1,3-disilacyclobutane. The co-photolysis process results in chemical vapour co-deposition of nanosized tellurium/polycarbosilane composite that contains amorphous nano-structures of tellurium stabilized against oxidation by organosilicon polymer. (en)
Title
  • Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process.
  • Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process. (en)
skos:prefLabel
  • Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process.
  • Polymer-Stabilized Nano-Sized Tellurium Films by Laser-Induced Chemical Vapour Co-Deposition Process. (en)
skos:notation
  • RIV/67985858:_____/03:27030014!RIV/2004/AV0/A27004/N
http://linked.open.../vavai/riv/strany
  • 394;398
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(IAA4072107), Z(AV0Z4032918), Z(AV0Z4040901), Z(AV0Z4072921)
http://linked.open...iv/cisloPeriodika
  • 2
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 621539
http://linked.open...ai/riv/idVysledku
  • RIV/67985858:_____/03:27030014
http://linked.open...riv/jazykVysledku
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  • tellurium film; polymer-stabilization; chemical vapour deposition (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [63F1A010D79A]
http://linked.open...i/riv/nazevZdroje
  • Journal of Materials Chemistry
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...ocetUcastnikuAkce
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http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 13
http://linked.open...iv/tvurceVysledku
  • Pola, Josef
  • Šubrt, Jan
  • Urbanová, Markéta
  • Bastl, Zdeněk
  • Bakardjieva, S.
  • Volnina, E. A.
http://linked.open...n/vavai/riv/zamer
issn
  • 0959-9428
number of pages
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