About: UV Laser Photolysis of Silacyclopent-3-ene: Effect of Admixtures on Nature of Chemically Vapour-Deposited Organosilicon Films.

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About: UV Laser Photolysis of Silacyclopent-3-ene: Effect of Admixtures on Nature of Chemically Vapour-Deposited Organosilicon Films. Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Examination of ArF laser-induced gas-phase photolysis of silacyclopent-3-ene, occuring as extrusion of silylene, in the presence of admixtures reveals that the photolysis is not interfered in the presence of N2, CO and CO2, but in the presence of O2, 2-C4F8, CH3OH, CD3OH, CF3CH2OH and CH3CO2H. Formation of volatile products and solid deposited films incorporating F or O atoms is interpreted in terms of reactions of silylene with the admixtures. Examination of ArF laser-induced gas-phase photolysis of silacyclopent-3-ene, occuring as extrusion of silylene, in the presence of admixtures reveals that the photolysis is not interfered in the presence of N2, CO and CO2, but in the presence of O2, 2-C4F8, CH3OH, CD3OH, CF3CH2OH and CH3CO2H. Formation of volatile products and solid deposited films incorporating F or O atoms is interpreted in terms of reactions of silylene with the admixtures. (en)
Title	UV Laser Photolysis of Silacyclopent-3-ene: Effect of Admixtures on Nature of Chemically Vapour-Deposited Organosilicon Films. UV Laser Photolysis of Silacyclopent-3-ene: Effect of Admixtures on Nature of Chemically Vapour-Deposited Organosilicon Films. (en)
skos:prefLabel	UV Laser Photolysis of Silacyclopent-3-ene: Effect of Admixtures on Nature of Chemically Vapour-Deposited Organosilicon Films. UV Laser Photolysis of Silacyclopent-3-ene: Effect of Admixtures on Nature of Chemically Vapour-Deposited Organosilicon Films. (en)
skos:notation	RIV/67985858:_____/02:27020180!RIV/2003/AV0/A27003/N
http://linked.open.../vavai/riv/strany	580;586
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA104/00/1294), Z(AV0Z4072921)
http://linked.open...iv/cisloPeriodika	10
http://linked.open...vai/riv/dodaniDat	2003
http://linked.open...aciTvurceVysledku	Urbanová, Markéta Pola, Josef
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav chemických procesů AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	668248
http://linked.open...ai/riv/idVysledku	RIV/67985858:_____/02:27020180
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	chemical vapour deposition; organisilicon films; laser photolysis (en)
http://linked.open.../riv/klicoveSlovo	chemical vapour deposition organisilicon films laser photolysis
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[D60F8188B9A3]
http://linked.open...i/riv/nazevZdroje	Applied Organometallic Chemistry
http://linked.open...in/vavai/riv/obor	CF
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	Laser photochemistry of (chloromethyl)silane and silacyclo-pent-3-ene for chemical vapour deposition of Si/C/H and Si/H phases
http://linked.open...UplatneniVysledku	2002
http://linked.open...v/svazekPeriodika	16
http://linked.open...iv/tvurceVysledku	Pola, Josef Urbanová, Markéta
http://linked.open...n/vavai/riv/zamer	Theoretical fundamentals of chemical processes: equilibrium and dynamic behavior of multiphase reacting systems
issn	0268-2605
number of pages	7 (xsd:int)

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