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  • Magneto-optic (MO) ellipsometry of ferromagnetic materials is extremely sensitive to ultra-thin films, multilayers, and nanostructures. It gives a possibility to measure all components of the magnetization vector in the frame of the magneto-optic vector magnetometry and enables us to separate magnetic contributions from different depths and materials in nanostructures, which is reviewed in this article. The method is based on ellipsometric separation using the selective MO Kerr effect. The figure of merit used to quantify the ellipsometric selectivity to magnetic nanostructures is defined on the basis of linear matrix algebra. We show that the method can be also used to separate MO contributions from areas of the same ferromagnetic materials deposited on different buffer layers.
  • Magneto-optic (MO) ellipsometry of ferromagnetic materials is extremely sensitive to ultra-thin films, multilayers, and nanostructures. It gives a possibility to measure all components of the magnetization vector in the frame of the magneto-optic vector magnetometry and enables us to separate magnetic contributions from different depths and materials in nanostructures, which is reviewed in this article. The method is based on ellipsometric separation using the selective MO Kerr effect. The figure of merit used to quantify the ellipsometric selectivity to magnetic nanostructures is defined on the basis of linear matrix algebra. We show that the method can be also used to separate MO contributions from areas of the same ferromagnetic materials deposited on different buffer layers. (en)
Title
  • Selective sensitivity of ellipsometry to magnetic nanostructures
  • Selective sensitivity of ellipsometry to magnetic nanostructures (en)
skos:prefLabel
  • Selective sensitivity of ellipsometry to magnetic nanostructures
  • Selective sensitivity of ellipsometry to magnetic nanostructures (en)
skos:notation
  • RIV/61989100:27360/11:86078880!RIV12-MSM-27360___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ED0040/01/01), P(KAN400100653), S, Z(MSM6198910016)
http://linked.open...iv/cisloPeriodika
  • 9
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 228698
http://linked.open...ai/riv/idVysledku
  • RIV/61989100:27360/11:86078880
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Magnetic nanostructures; Material sensitivity; Magneto-optical ellipsometry; Generalized ellipsometry (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [D3F3B58C517E]
http://linked.open...i/riv/nazevZdroje
  • Thin Solid Films
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 519
http://linked.open...iv/tvurceVysledku
  • Hrabovský, David
  • Pištora, Jaromír
  • Postava, Kamil
  • Sveklo, I.
  • Baczewski, L.
  • Hamrlová, Jana
  • Maziewski, Andrej
  • Wawro, Andrej
http://linked.open...ain/vavai/riv/wos
  • 000289174200013
http://linked.open...n/vavai/riv/zamer
issn
  • 0040-6090
number of pages
http://localhost/t...ganizacniJednotka
  • 27360
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