About: Capillary Plasma Radiation Source in the Soft X-Ray Region

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Plasma dynamics and emission characteristics of pinching capillary discharge simulated by Zcode are presented and compared with experimental results. The investigated setup consisted of capillary with radius R0 = 0.16 cm, length L = 10 cm filled by nitrogen, connected to capacitor C = 21 nF, charged to U0 = 70 kV, was studied. Both calculated and measured current profiles were near to dumped sinus with the peak 23 kA and the half period 150 ns. The output power of emission in the %22water window%22 at the wavelength = 2,88 nm depends on the initial nitrogen pressure. The time dependences of the line-emitted power have pulse shapes with two remarkable peaks. The highest peak corresponding to the pinch time has the value 1.8 MW at pressure 100 Pa. At this time the plasma electron temperature 40 eV < Te < 80 eV is evaluated in the column with the radius 600 m. The estimated pulse emitted energy 5.5 mJ.sr-1 (1014 photons.sr-1) corresponds properly to observed experimental value. Plasma dynamics and emission characteristics of pinching capillary discharge simulated by Zcode are presented and compared with experimental results. The investigated setup consisted of capillary with radius R0 = 0.16 cm, length L = 10 cm filled by nitrogen, connected to capacitor C = 21 nF, charged to U0 = 70 kV, was studied. Both calculated and measured current profiles were near to dumped sinus with the peak 23 kA and the half period 150 ns. The output power of emission in the %22water window%22 at the wavelength = 2,88 nm depends on the initial nitrogen pressure. The time dependences of the line-emitted power have pulse shapes with two remarkable peaks. The highest peak corresponding to the pinch time has the value 1.8 MW at pressure 100 Pa. At this time the plasma electron temperature 40 eV < Te < 80 eV is evaluated in the column with the radius 600 m. The estimated pulse emitted energy 5.5 mJ.sr-1 (1014 photons.sr-1) corresponds properly to observed experimental value. (en)
Title	Capillary Plasma Radiation Source in the Soft X-Ray Region Capillary Plasma Radiation Source in the Soft X-Ray Region (en)
skos:prefLabel	Capillary Plasma Radiation Source in the Soft X-Ray Region Capillary Plasma Radiation Source in the Soft X-Ray Region (en)
skos:notation	RIV/61389021:_____/12:00386239!RIV13-AV0-61389021
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(EE.2.3.20.0092), P(GAP102/12/2043), P(LA08024), Z(AV0Z20430508)
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Vrba, Pavel
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav fyziky plazmatu AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	125950
http://linked.open...ai/riv/idVysledku	RIV/61389021:_____/12:00386239
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Z-pinch; X-ray laser and radiation source; MHD simulations; numerical modelling (en)
http://linked.open.../riv/klicoveSlovo	MHD simulations X-ray laser and radiation source Z-pinch numerical modelling
http://linked.open...ontrolniKodProRIV	[7163FC069C51]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Pulse Source of Soft X-ray for Biomedical Applications Research in the Frame of the International Center for Dense Magnetized Plasmas - ICDMP BIO-XUV Research Team Advancement at FBME CTU
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Vrba, Pavel Jančárek, A. Nevrkla, M. Vrbová, M. Zakharov, S. V. Zakharov, V. S.
http://linked.open...n/vavai/riv/zamer	Physical and chemical processes in plasmas and theis applications

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