About: Pre-Pulse Current Measurement of the Fast High-Current Capillary-Discharge Experiment

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	We have built two experimental apparatuses CAPEX and CAPEX-U as XUV sources, which are based on the fast capillary discharge. On both these devices we have observed lasing at 46.9 nm (Ne-like Ar line). However, these devices are not only lasing at 46.9 nm, but they are used for testing a possibility of amplification at the wavelength below 20 nm that have more practical applications. Nowadays, the fast high-current capillary-discharge experiments with nitrogen-filled capillary are in progress as well. In this paper the pre-pulse capillary current and its influence on discharge parameters (the main current amplitude and duration, the plasma temperature and ionization stage) will be studied with the help of spectroscopic measurements. We have built two experimental apparatuses CAPEX and CAPEX-U as XUV sources, which are based on the fast capillary discharge. On both these devices we have observed lasing at 46.9 nm (Ne-like Ar line). However, these devices are not only lasing at 46.9 nm, but they are used for testing a possibility of amplification at the wavelength below 20 nm that have more practical applications. Nowadays, the fast high-current capillary-discharge experiments with nitrogen-filled capillary are in progress as well. In this paper the pre-pulse capillary current and its influence on discharge parameters (the main current amplitude and duration, the plasma temperature and ionization stage) will be studied with the help of spectroscopic measurements. (en)
Title	Pre-Pulse Current Measurement of the Fast High-Current Capillary-Discharge Experiment Pre-Pulse Current Measurement of the Fast High-Current Capillary-Discharge Experiment (en)
skos:prefLabel	Pre-Pulse Current Measurement of the Fast High-Current Capillary-Discharge Experiment Pre-Pulse Current Measurement of the Fast High-Current Capillary-Discharge Experiment (en)
skos:notation	RIV/61389021:_____/11:00365903!RIV12-AV0-61389021
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(KAN300100702), P(LA08024), P(LC528), Z(AV0Z20430508)
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Prukner, Václav Štraus, Jaroslav Koláček, Karel Schmidt, Jiří Frolov, Oleksandr
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav fyziky plazmatu AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	223131
http://linked.open...ai/riv/idVysledku	RIV/61389021:_____/11:00365903
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Capillary discharge; laser; XUV (en)
http://linked.open.../riv/klicoveSlovo	Capillary discharge XUV laser
http://linked.open...ontrolniKodProRIV	[FA7872483BF5]
http://linked.open...v/mistoKonaniAkce	Atlanta
http://linked.open...i/riv/mistoVydani	Atlanta
http://linked.open...i/riv/nazevZdroje	Proceedings of the 2010 IEEE International Power Modulator and High Voltage Conference
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Creating and probing nanostructures with X-ray lasers Research in the Frame of the International Center for Dense Magnetized Plasmas - ICDMP Centre of Laser Plasma
http://linked.open...UplatneniVysledku	2011
http://linked.open...iv/tvurceVysledku	Frolov, Oleksandr Koláček, Karel Prukner, Václav Schmidt, Jiří Štraus, Jaroslav
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2010-05-23 (xsd:date)
http://linked.open...n/vavai/riv/zamer	Physical and chemical processes in plasmas and theis applications
number of pages	3 (xsd:int)
http://purl.org/ne...btex#hasPublisher	IEEE
https://schema.org/isbn	978-1-4244-7129-4

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