About: Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances

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About: Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Efficiency of the photodegradation of poly[methyl(phenyl)silylene] can be increased by electron acceptor additives with unstable anion radicals. The best chain degradation yield was obtained using benzoyl peroxide as an additive. The model for the photodegradation process is supported by quantum chemical calculations. Efficiency of the photodegradation of poly[methyl(phenyl)silylene] can be increased by electron acceptor additives with unstable anion radicals. The best chain degradation yield was obtained using benzoyl peroxide as an additive. The model for the photodegradation process is supported by quantum chemical calculations. (en)
Title	Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances (en)
skos:prefLabel	Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances (en)
skos:notation	RIV/61389013:_____/10:00358498!RIV12-AV0-61389013
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(IAA100100622), P(KAN400720701), P(OC 138), Z(AV0Z40500505)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Peter, Jakub Nešpůrek, Stanislav Nožár, Juraj Kochalska, Anna
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav makromolekulární chemie AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	278817
http://linked.open...ai/riv/idVysledku	RIV/61389013:_____/10:00358498
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	lithography; photodegradation; polymer (en)
http://linked.open.../riv/klicoveSlovo	lithography photodegradation polymer
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[54827A2943C4]
http://linked.open...i/riv/nazevZdroje	Macromolecular Symposia
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Hierarchic nanosystems for microelektronics http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20138 CONJUGATED SILICON – BASED POLYMER RESISTS FOR NANOTECHNOLOGIES
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	295
http://linked.open...iv/tvurceVysledku	Kochalska, Anna Nešpůrek, Stanislav Nožár, Juraj Peter, Jakub
http://linked.open...ain/vavai/riv/wos	000288038700008
http://linked.open...n/vavai/riv/zamer	Progresivní makromolekulární materiály a supramolekulární systémy: syntéza a studium vlastností, jevů a možností využití pro speciální aplikace a moderní technologie
issn	1022-1360
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1002/masy.200900075

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