About: Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge

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About: Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	An atmospheric pressure dielectric barrier discharge burning in nitrogen with a small admixture of hexamethyldisiloxane (HMDSO) was used for the deposition of thin organosilicon films. The thin films were deposited on glass, silicon and polycarbonate substrates, and the substrate temperature during the deposition process was increased up to values within the range 25-150 degrees C in order to obtain hard SiOx-like thin films. The properties of the discharge were studied by means of optical emission spectroscopy and electrical measurements. The deposited films were characterized by the Rutherford backscattering and elastic recoil detection methods, x-ray photoelectron spectroscopy, infrared spectroscopy measurements, ellipsometry and the depth sensing indentation technique. It was found that the films' properties depend significantly on the substrate temperature at deposition. An atmospheric pressure dielectric barrier discharge burning in nitrogen with a small admixture of hexamethyldisiloxane (HMDSO) was used for the deposition of thin organosilicon films. The thin films were deposited on glass, silicon and polycarbonate substrates, and the substrate temperature during the deposition process was increased up to values within the range 25-150 degrees C in order to obtain hard SiOx-like thin films. The properties of the discharge were studied by means of optical emission spectroscopy and electrical measurements. The deposited films were characterized by the Rutherford backscattering and elastic recoil detection methods, x-ray photoelectron spectroscopy, infrared spectroscopy measurements, ellipsometry and the depth sensing indentation technique. It was found that the films' properties depend significantly on the substrate temperature at deposition. (en)
Title	Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge (en)
skos:prefLabel	Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge Deposition of hard thin films from HMDSO in atmospheric pressure dielectric barrier discharge (en)
skos:notation	RIV/61389005:_____/10:00348989!RIV11-AV0-61389005
http://linked.open...avai/riv/aktivita	V Z
http://linked.open...avai/riv/aktivity	V, Z(AV0Z10100521), Z(AV0Z10480505), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	22
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Peřina, Vratislav
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav jaderné fyziky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	253354
http://linked.open...ai/riv/idVysledku	RIV/61389005:_____/10:00348989
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	GLOW-DISCHARGE; CHEMICAL-STRUCTURE; PLASMA (en)
http://linked.open.../riv/klicoveSlovo	PLASMA GLOW-DISCHARGE CHEMICAL-STRUCTURE
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[BA565E548EE0]
http://linked.open...i/riv/nazevZdroje	Journal of Physics D-Applied Physics
http://linked.open...in/vavai/riv/obor	BG
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	10 (xsd:int)
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	43
http://linked.open...iv/tvurceVysledku	Bursíková, V. Franta, D. Peřina, Vratislav Zajíčková, L. Houdková, Jana Sťahel, P. Navrátil, Z. Prysiazhnyi, V. Studnička, F. Trunec, D.
http://linked.open...ain/vavai/riv/wos	000277871500011
http://linked.open...n/vavai/riv/zamer	Physics and technology of nanostructures, surfaces and thin films Jaderná fyzika a příbuzné obory v základním, aplikovaném a interdisciplinárním výzkumu Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0022-3727
number of pages	8 (xsd:int)

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