| Attributes | Values |
|---|
| rdf:type
| |
| Description
| - Five hundred nanometer thick organosilicon coatings are prepared on Si substrates in parallel by the plasma-assisted polymerisation of hexamethyldisiloxane (HMDSO) in an RF-inductively coupled plasma (RFICP) and distributed electron cyclotron resonance plasma (DECRP) at low pressure (0.27 Pa) and of tetramethyldisiloxane (TMDSO) premixed with oxygen in an N-2 microwave induced remote afterglow (MIRA) at 560 Pa. The structure of these different films is analyzed by different techniques, such as Fourier-transform infrared spectroscopy, Rutherford backscattering spectrometry, atomic force microscopy, ellipsometry, and contact angle measurements. Results of the film composition (at least 30% carbon content), optical properties, and morphology indicate a low cross-linking degree accompanied by short chain length for RFICP and DECRP films, in contrast to a high-molecular-weight structure observed for the MIRA film.
- Five hundred nanometer thick organosilicon coatings are prepared on Si substrates in parallel by the plasma-assisted polymerisation of hexamethyldisiloxane (HMDSO) in an RF-inductively coupled plasma (RFICP) and distributed electron cyclotron resonance plasma (DECRP) at low pressure (0.27 Pa) and of tetramethyldisiloxane (TMDSO) premixed with oxygen in an N-2 microwave induced remote afterglow (MIRA) at 560 Pa. The structure of these different films is analyzed by different techniques, such as Fourier-transform infrared spectroscopy, Rutherford backscattering spectrometry, atomic force microscopy, ellipsometry, and contact angle measurements. Results of the film composition (at least 30% carbon content), optical properties, and morphology indicate a low cross-linking degree accompanied by short chain length for RFICP and DECRP films, in contrast to a high-molecular-weight structure observed for the MIRA film. (en)
- Organosilikonové vrstvy byly připravovány na křemíkových substrátech paralelně plasmaticky asistovanou depozicí v hexametyldisiloxanu (HMDSO) a v radio-frekvenčním plasmatu (RFICP), elektron cyklotronovém rezonančním plasmatu (DECRP) při nízkém tlaku 0.27 Pa a dále s použitím reaktoru MIRA při 560 Pa polymerizací tetrametyldisiloxanu (TMDSO) mixovaným s kyslíkem. Struktura a složení těchto vrstev byla zkoumána různými analytickými metodami infračervené spektroskopie FTIR, spektroskopie zpětně odražených iontů (RBS),mikroskopií atomárních sil (AFM), elipsometrií a měřením kontaktního úhlu. Výsledky složení deponovaných vrstev (obsahují minimálně 30% uhlíku), měření optických a strukturních vlastností indikuje vznik málo zasíťované polymerní struktury v přápadě depozičních reaktorů RCFIP a DECRP v kontrastu s polymery vysoké molekulární hmotnosti připravených metodou MIRA. (cs)
|
| Title
| - Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors
- Růst a modifikace organosilikonových vrstev v plasmatických reaktorech (cs)
- Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors (en)
|
| skos:prefLabel
| - Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors
- Růst a modifikace organosilikonových vrstev v plasmatických reaktorech (cs)
- Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors (en)
|
| skos:notation
| - RIV/61389005:_____/06:00032069!RIV06-AV0-61389005
|
| http://linked.open.../vavai/riv/strany
| |
| http://linked.open...avai/riv/aktivita
| |
| http://linked.open...avai/riv/aktivity
| - P(1P05OC014), P(OC 143), P(OC 527.100), Z(AV0Z90610521)
|
| http://linked.open...iv/cisloPeriodika
| |
| http://linked.open...vai/riv/dodaniDat
| |
| http://linked.open...aciTvurceVysledku
| |
| http://linked.open.../riv/druhVysledku
| |
| http://linked.open...iv/duvernostUdaju
| |
| http://linked.open...titaPredkladatele
| |
| http://linked.open...dnocenehoVysledku
| |
| http://linked.open...ai/riv/idVysledku
| - RIV/61389005:_____/06:00032069
|
| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - FT-IR; organosilicon precursors; plasma polymerisation (en)
|
| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
| - DE - Spolková republika Německo
|
| http://linked.open...ontrolniKodProRIV
| |
| http://linked.open...i/riv/nazevZdroje
| - Plasma Processes and Polymers
|
| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
| |
| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...vavai/riv/projekt
| |
| http://linked.open...UplatneniVysledku
| |
| http://linked.open...v/svazekPeriodika
| |
| http://linked.open...iv/tvurceVysledku
| - Macková, Anna
- Granier, A.
- Supiot, P.
- Pavlík, J.
- Strýhal, Z.
- Raynaud, P.
- Vivien, C.
- Escaich, D.
- Bousquet, A.
- Clergereaux, R.
|
| http://linked.open...n/vavai/riv/zamer
| |
| issn
| |
| number of pages
| |
![[RDF Data]](/fct/images/sw-rdf-blue.png)
![[cxml]](/fct/images/cxml_doc.png)
![[csv]](/fct/images/csv_doc.png)
![[text]](/fct/images/ntriples_doc.png)
![[turtle]](/fct/images/n3turtle_doc.png)
![[ld+json]](/fct/images/jsonld_doc.png)
![[rdf+json]](/fct/images/json_doc.png)
![[rdf+xml]](/fct/images/xml_doc.png)
![[atom+xml]](/fct/images/atom_doc.png)
![[html]](/fct/images/html_doc.png)