Attributes | Values |
---|
rdf:type
| |
Description
| - Optimalizační experimenty s fokusujícím monochromátorem Si(220)pro difraktometr určený k měření zbytkových napětí v polykrystalických materiálech ukázaly velké přednosti v porovnání s konvenčními mozaikovými monochromátory. (cs)
- Optimized diffractometer arrangements for residual strain measurements employing curved crystal monochromators provide good luminosity and a high Delta d/d resolution in the vicinity of usually used scattering angle 2 theta(S) 90 degrees. Due to a variety of designs of the diffractometers which could be installed at a constant or different take-off angles, except a few attempts, there is a lack of experimental evidence providing a help in a choice of parameters for an optimum performance. In addition to our earlier investigations with curved Si(311) monochromator employed in different diffraction geometries (see paper I [M.K. Moon et al., Physica B, submitted [1]]), the present paper presents the monochromator properties of cylindrically bent perfect Si(220) crystals as another candidate to be used as monochromator in residual strain diffractometers.
- Optimized diffractometer arrangements for residual strain measurements employing curved crystal monochromators provide good luminosity and a high Delta d/d resolution in the vicinity of usually used scattering angle 2 theta(S) 90 degrees. Due to a variety of designs of the diffractometers which could be installed at a constant or different take-off angles, except a few attempts, there is a lack of experimental evidence providing a help in a choice of parameters for an optimum performance. In addition to our earlier investigations with curved Si(311) monochromator employed in different diffraction geometries (see paper I [M.K. Moon et al., Physica B, submitted [1]]), the present paper presents the monochromator properties of cylindrically bent perfect Si(220) crystals as another candidate to be used as monochromator in residual strain diffractometers. (en)
|
Title
| - Optimization of bent perfect Si(220)-crystal monochromator for residual strain/stress instrument - Part II
- Optimization of bent perfect Si(220)-crystal monochromator for residual strain/stress instrument - Part II (en)
- Optimalizace ohnutého monokrystalického monochromátoru Si(220) pro zařízení určené k měření zbytkových napětí – Část II (cs)
|
skos:prefLabel
| - Optimization of bent perfect Si(220)-crystal monochromator for residual strain/stress instrument - Part II
- Optimization of bent perfect Si(220)-crystal monochromator for residual strain/stress instrument - Part II (en)
- Optimalizace ohnutého monokrystalického monochromátoru Si(220) pro zařízení určené k měření zbytkových napětí – Část II (cs)
|
skos:notation
| - RIV/61389005:_____/05:00030678!RIV06-AV0-61389005
|
http://linked.open.../vavai/riv/strany
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| - P(GA202/03/0891), Z(AV0Z10480505), Z(MSM2672244501)
|
http://linked.open...iv/cisloPeriodika
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/61389005:_____/05:00030678
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - neutron diffraction; focusing; neutron diffraction (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...odStatuVydavatele
| |
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...i/riv/nazevZdroje
| |
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...v/svazekPeriodika
| |
http://linked.open...iv/tvurceVysledku
| - Mikula, Pavol
- Moon, M. K.
- Hong, K. P.
|
http://linked.open...n/vavai/riv/zamer
| |
issn
| |
number of pages
| |