About: Mechanism of the film composition formation during magnetron sputtering of WTi.

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The WTi films were deposited by an unbalanced magnetron sputtering of a WTi (70:30 at. %) alloy target. The influence of the working gas (Ar) pressure, substrate bias, and substrate location on the composition of films was studied. The films deposited at low working gas pressures (<1 Pa) onto electrically floating substrates were largely depleted in Ti while the composition of films deposited at high argon pressure (25 Pa) was close to that of the target. The ion bombardment of the growing film resulted in a decreaseof the Ti content in the films. The composition of the films deposited simultaneously onto a pair of substrates placed at the axis and at the periphery of the target did not depend on the substrate position at both low and high pressure. The WTi films were deposited by an unbalanced magnetron sputtering of a WTi (70:30 at. %) alloy target. The influence of the working gas (Ar) pressure, substrate bias, and substrate location on the composition of films was studied. The films deposited at low working gas pressures (<1 Pa) onto electrically floating substrates were largely depleted in Ti while the composition of films deposited at high argon pressure (25 Pa) was close to that of the target. The ion bombardment of the growing film resulted in a decreaseof the Ti content in the films. The composition of the films deposited simultaneously onto a pair of substrates placed at the axis and at the periphery of the target did not depend on the substrate position at both low and high pressure. (en)
Title	Mechanism of the film composition formation during magnetron sputtering of WTi. Mechanism of the film composition formation during magnetron sputtering of WTi. (en)
skos:prefLabel	Mechanism of the film composition formation during magnetron sputtering of WTi. Mechanism of the film composition formation during magnetron sputtering of WTi. (en)
skos:notation	RIV/61389005:_____/01:49010112!RIV/2003/AV0/A49003/N
http://linked.open.../vavai/riv/strany	2554;2566
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GV202/97/K038), P(KSK1010104), Z(AV0Z1048901)
http://linked.open...iv/cisloPeriodika	5
http://linked.open...vai/riv/dodaniDat	2003
http://linked.open...aciTvurceVysledku	Peřina, Vratislav Macková, Anna
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav jaderné fyziky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	686343
http://linked.open...ai/riv/idVysledku	RIV/61389005:_____/01:49010112
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	N/A (en)
http://linked.open.../riv/klicoveSlovo	N/A
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[0A807B6C8C03]
http://linked.open...i/riv/nazevZdroje	Journal of Vacuum Science and Technology. A - Vacuum Surfaces and Films
http://linked.open...in/vavai/riv/obor	BG
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	Condensed matter physics and materials science Centre for fundamental and applied neutron research
http://linked.open...UplatneniVysledku	2001
http://linked.open...v/svazekPeriodika	19
http://linked.open...iv/tvurceVysledku	Jastrabík, L. Macková, Anna Peřina, Vratislav Kadlec, S. Misina, M. Shagizan, L. R.
http://linked.open...n/vavai/riv/zamer	Theoretical and experimental investigation of atomic nuclei and exploitation of nuclear methods in interdisciplinary research
issn	0734-2101
number of pages	13 (xsd:int)

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