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Description
| - Laser irradiation at 193 nm of gaseous mixtures of carbon disulfide and ethene induces copolymerization of both compounds and affords chemical vapor deposition of conjugated nano-chained C/S/H polymer, with contributions from C2H4 and CS2 almost unaffected by very different initial ratio of both educts. The polymer structure is interpreted on the basis of X-ray photoelectron and FTIR spectra as consisting of >C=S, >C=C<, -CH2-CH2-, (C=C)SnC4-n, -C-(C=S)-S-, -S-(C=S)-S- and ůC-S-S-C- configurations, whose extent is dependent on the irradiation conditions.
- Laser irradiation at 193 nm of gaseous mixtures of carbon disulfide and ethene induces copolymerization of both compounds and affords chemical vapor deposition of conjugated nano-chained C/S/H polymer, with contributions from C2H4 and CS2 almost unaffected by very different initial ratio of both educts. The polymer structure is interpreted on the basis of X-ray photoelectron and FTIR spectra as consisting of >C=S, >C=C<, -CH2-CH2-, (C=C)SnC4-n, -C-(C=S)-S-, -S-(C=S)-S- and ůC-S-S-C- configurations, whose extent is dependent on the irradiation conditions. (en)
- Ozáření plynných směsí sirouhlíku a ethylenu laserovým zářením s vlnovou délkou 193 nm indukuje kopolymerizaci a poskytuje deposity konjugovaných nano-zřetězených C/S/H polymerů. Polymerní struktury byly identifikovány na základě XP a FTIR spekter. Bylo zjištěno, že obsahují >C=S, >C=C<, -CH2-CH2-, (C=C)SnC4-n, -C-(C=S)-S-, -S-(C=S)-S- a C-S-S-C konfigurace, jejichž zastoupení závisí na podmínkách ozáření. (cs)
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Title
| - UV Laser Chemical Vapor Deposition of Nano-Chained Copolymer from Carbon Disulfide and Ethene
- UV Laser Chemical Vapor Deposition of Nano-Chained Copolymer from Carbon Disulfide and Ethene (en)
- Depozice nano-zřetězeného kopolymeru ze sirouhlíku a ethylenu působením UV laserového záření (cs)
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skos:prefLabel
| - UV Laser Chemical Vapor Deposition of Nano-Chained Copolymer from Carbon Disulfide and Ethene
- UV Laser Chemical Vapor Deposition of Nano-Chained Copolymer from Carbon Disulfide and Ethene (en)
- Depozice nano-zřetězeného kopolymeru ze sirouhlíku a ethylenu působením UV laserového záření (cs)
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skos:notation
| - RIV/61388955:_____/04:00107643!RIV/2005/AV0/A54005/N
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(ME 612), Z(AV0Z4040901)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/61388955:_____/04:00107643
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - carbon disulfide; copolymerization; ethene (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - CH - Švýcarská konfederace
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Macromolecular Chemistry and Physics
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Pola, Josef
- Tomovska, R.
- Bastl, Zdeněk
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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