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  • This paper is focused on fabrication of glass microfluidic chips to study electroosmotic flow, which is one of the most important method of liquid transport in microsystems. We have used standard flat glass for micro-fabrication. Flat glass is coated with a thin layer of metal (chromium, gold, etc.). Structures in metal are fabricated using UV-photolithography. Structured metal layer is used as a cover layer in the step of isotropic glass etching. To get the fabricated pieces with microstuctures together low temperature bonding is used after etching. Examples of fabricated glass microfluidic chips are presented.
  • This paper is focused on fabrication of glass microfluidic chips to study electroosmotic flow, which is one of the most important method of liquid transport in microsystems. We have used standard flat glass for micro-fabrication. Flat glass is coated with a thin layer of metal (chromium, gold, etc.). Structures in metal are fabricated using UV-photolithography. Structured metal layer is used as a cover layer in the step of isotropic glass etching. To get the fabricated pieces with microstuctures together low temperature bonding is used after etching. Examples of fabricated glass microfluidic chips are presented. (en)
  • Tento příspevěk je zaměřen na výrobu skleněných mikrofluidních čipů pro studium elektroosmotického toku, který je důležitou metodou dopravy tekutin v mikrosystému. Pro výrobu je použito standardní tabulové sklo. Jsou použity různé metody výroby. (cs)
Title
  • Fabrication of glass fluidic microchips
  • Fabrication of glass fluidic microchips (en)
  • Výroba fluidních mikročipů ze skelných substrátů (cs)
skos:prefLabel
  • Fabrication of glass fluidic microchips
  • Fabrication of glass fluidic microchips (en)
  • Výroba fluidních mikročipů ze skelných substrátů (cs)
skos:notation
  • RIV/60461373:22340/07:00018432!RIV08-GA0-22340___
http://linked.open.../vavai/riv/strany
  • 062(1-6)
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  • P(GD104/03/H141)
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  • 421536
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  • RIV/60461373:22340/07:00018432
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  • glass microfabrication; low-temperature bonding; UV-lithography (en)
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  • [E5C9607850AB]
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  • Tatranské Matliare
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  • Bratislava
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  • Proceedings of 34th International Conference of Slovak Society of Chemical Engineering, 21.-25.5.2007, Tatranské Matliare, Slovenská republika
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  • Jindra, Tomáš
  • Šnita, Dalimil
  • Kotowski, J.
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number of pages
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  • Slovenská společnost chemického inženýrství
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  • 978-80-227-2640-5
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  • 22340
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