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  • Nickel oxide thin films, for use as function sensor layers for chemical sensors, have been deposited on Si and alumina substrates by DC magnetron sputtering. The influence of deposition parameters and annealing temperature on the structiral properties and surface roughness has been analyzed by X-ray diffraction and atomic force microscopy. The NiO thin films were tested in order to investigate their response to hydrogen in the concentrations up to 1.5 vol% and ethanol in the interval 0-1200 ppm at different operating temperatures.
  • Nickel oxide thin films, for use as function sensor layers for chemical sensors, have been deposited on Si and alumina substrates by DC magnetron sputtering. The influence of deposition parameters and annealing temperature on the structiral properties and surface roughness has been analyzed by X-ray diffraction and atomic force microscopy. The NiO thin films were tested in order to investigate their response to hydrogen in the concentrations up to 1.5 vol% and ethanol in the interval 0-1200 ppm at different operating temperatures. (en)
Title
  • Physical and Structural Characterization of NiO Films for Gas Detection
  • Physical and Structural Characterization of NiO Films for Gas Detection (en)
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  • Physical and Structural Characterization of NiO Films for Gas Detection
  • Physical and Structural Characterization of NiO Films for Gas Detection (en)
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  • RIV/60461373:22340/02:00007031!RIV/2004/MSM/223404/N
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  • 107;110
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  • Z(MSM 223400007)
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  • 658258
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  • RIV/60461373:22340/02:00007031
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  • thin films; gas detection; nickel oxide; sputtering (en)
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  • [6A36BF3B04C1]
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  • Bratislava
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  • Bratislava
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  • The Fourth International Conference on Advanced Semiconductor Devices and Microsystems ASDAM´02
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  • Řeháček, V.
  • Kremer, J.
  • Spiess, L.
  • Hotový, I.
  • Široký, Karel
  • Schawohl, J.
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number of pages
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  • Slovenská technická univerzita v Bratislave
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  • 0-7803-7276-X
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  • 22340
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