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  • The thin gold films were prepared by DC plasma sputtering in argon atmosphere on glass substrates with different sputtering times. On experimental samples with thicknesses from 10 to 90 nm the XRD structural analysis was carried out in order to observe the real structure changes in dependence on the film thickness. The XRD analysis included calcula-tion of lattice parameters, biaxial stress and size of the crystallites and micro-strains. A sim-ple evaluation of preferred orientation of crystallites perpendicular to the sample surface using the integral intensities ratio of two strongest diffraction lines was also performed. The results show strong dependence of all parameters on thickness of Au films. The size of the crystallites is linearly increasing with growing film thickness whereas the lattice parameter is decreasing. The course of micro-strain and biaxial lattice stress is rapidly changing with increasing thickness of gold films due to relaxation of the structure.
  • The thin gold films were prepared by DC plasma sputtering in argon atmosphere on glass substrates with different sputtering times. On experimental samples with thicknesses from 10 to 90 nm the XRD structural analysis was carried out in order to observe the real structure changes in dependence on the film thickness. The XRD analysis included calcula-tion of lattice parameters, biaxial stress and size of the crystallites and micro-strains. A sim-ple evaluation of preferred orientation of crystallites perpendicular to the sample surface using the integral intensities ratio of two strongest diffraction lines was also performed. The results show strong dependence of all parameters on thickness of Au films. The size of the crystallites is linearly increasing with growing film thickness whereas the lattice parameter is decreasing. The course of micro-strain and biaxial lattice stress is rapidly changing with increasing thickness of gold films due to relaxation of the structure. (en)
Title
  • XRD real structure characterization of sputtered Au films different in thickness
  • XRD real structure characterization of sputtered Au films different in thickness (en)
skos:prefLabel
  • XRD real structure characterization of sputtered Au films different in thickness
  • XRD real structure characterization of sputtered Au films different in thickness (en)
skos:notation
  • RIV/60461373:22310/11:43893001!RIV12-GA0-22310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA106/09/0125), P(GAP108/10/1106)
http://linked.open...iv/cisloPeriodika
  • 1
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  • 242006
http://linked.open...ai/riv/idVysledku
  • RIV/60461373:22310/11:43893001
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • DC plasma sputtering; Au films; XRD analysis (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [B6CFF6399928]
http://linked.open...i/riv/nazevZdroje
  • Zeitschrift für Kristallographie Proceedings
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http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • Neuveden
http://linked.open...iv/tvurceVysledku
  • Kolská, Zdeňka
  • Siegel, Jakub
  • Šutta, P.
  • Švorčík, Václav
  • Říha, J.
issn
  • 1869-1315
number of pages
http://bibframe.org/vocab/doi
  • 10.1524/zkpr.2011.0032
http://localhost/t...ganizacniJednotka
  • 22310
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