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Description
  • Různé techniky byly použity pro přípravu tenkých nanovrstev oxidu titaničitého. Nanášení vrstev bylo prováděno v prostředí chemicky aktivního plazmatu za využití přístrojů PVD ?hollow cathode plasma? sputtering systémem, PVD magnetronovým sputteringem a PECVD technologií využívající surfatronovou plasmu. Příprava vrstev metodou sol-gel probíhala v prostředí reverzních micel. Všechny typy vrstev byly testovány na foto-indukované elektrochemické vlastnosti na základě vyhodnocení polarizačních křivek a odpovídajících fotoproudů (cs)
  • Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environmental of chemically active plasma due to the utilization of plasma assisted device including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All type were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents.
  • Various techniques were used for the preparation of titanium (IV) oxide nanoscaled thin films. The deposition of the layers was carried out in the environmental of chemically active plasma due to the utilization of plasma assisted device including PVD hollow cathode plasma jet sputtering system, PVD magnetron sputtering and PECVD technique using surfatron produced plasma discharge as a jet type. The sol-gel process realized in the reverse micelle environment was chosen as a purely chemical procedure. All type were tested then for their photo-induced electrochemical properties based on evaluation of polarization curves and corresponding photocurrents. (en)
Title
  • Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers
  • Plasmatické nanášení a fotoelektrochemické vlastnosti tenkých vrstev oxidu titaničitého (cs)
  • Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers (en)
skos:prefLabel
  • Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers
  • Plasmatické nanášení a fotoelektrochemické vlastnosti tenkých vrstev oxidu titaničitého (cs)
  • Plasma deposition and Photoelectrochemical properties of Nanoscaled Titanium(IV) oxide thin layers (en)
skos:notation
  • RIV/60461373:22310/08:00020173!RIV09-AV0-22310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1M0577), P(KAN400720701)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 386779
http://linked.open...ai/riv/idVysledku
  • RIV/60461373:22310/08:00020173
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • PVD; sol-gel; titanium dioxide; photocurrent (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [CADEA1FCBBF9]
http://linked.open...v/mistoKonaniAkce
  • Hnanice
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  • Praha
http://linked.open...i/riv/nazevZdroje
  • Proceedings of the workshop Recent advances in photochemistry, electrochemistry and photocatalysis
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Krýsa, Josef
  • Klusoň, Petr
  • Straňák, V.
  • Hubička, Martin
  • Čada, M.
  • Kment, Š.
  • Virostko, P.
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
number of pages
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  • Vysoká škola chemicko-technologická v Praze
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  • 978-80-7080-680-7
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  • 22310
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