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| rdf:type
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| Description
| - Particulate TiO2 layers of various thickness were prepared by sedimentation from suspension and investigated by SEM, UV-VIS spectroscopy, photocurrents and photodegradation rate measurement. In pure electrolyte (Na2SO4) the photocurrent reaches a maximum around 0.5 #m and then rapidly decreases with increasing thickness. The explanation consists in the fact that with increasing layer thickness the average distance of photogenerated electrons and holes from back contact of electrode increases. This results in higher recombination and lower electron flux (photocurrent) to the back contact. In the presence of oxalic acid photocurrent is about one order higher than in Na2SO4 and it does not decrease with layer thickness. It can be attributed to the strong adsorption of oxalic acid, which is directly oxidized by holes. The stationary concentration of holes is thus very small and the probability that electron/hole pairs will recombine is much lower than in pure electrolyte and does not depend too much on th
- Particulate TiO2 layers of various thickness were prepared by sedimentation from suspension and investigated by SEM, UV-VIS spectroscopy, photocurrents and photodegradation rate measurement. In pure electrolyte (Na2SO4) the photocurrent reaches a maximum around 0.5 #m and then rapidly decreases with increasing thickness. The explanation consists in the fact that with increasing layer thickness the average distance of photogenerated electrons and holes from back contact of electrode increases. This results in higher recombination and lower electron flux (photocurrent) to the back contact. In the presence of oxalic acid photocurrent is about one order higher than in Na2SO4 and it does not decrease with layer thickness. It can be attributed to the strong adsorption of oxalic acid, which is directly oxidized by holes. The stationary concentration of holes is thus very small and the probability that electron/hole pairs will recombine is much lower than in pure electrolyte and does not depend too much on th (en)
- Částicové TiO2 vrstvy o různé tloušťce byly připraveny sedimentací ze suspense a zkoumány metodou SEM, UV-VIS spectroskopie, měřením fotoproudů a rychlosti fotodegradace. V čistém elektrolytu (Na2SO4) dosahuje fotoproud maxima okolo 0.5 #m a pak rychle klesá s rosoucí tloušťkou. Vysvětlení spočívá ve skutečnosti, že rostoucí tloušťkou roste vzdálenost fotogenerovaných elektronů a děr od kovového kontaktu elektrody. To vede k vyšší rekombinaci a nižšímu toku elektronůt (fotoproudu) ke kovovému kontaktu elektrody. V přítomnosti kyseliny šťavelové je fotoproud asi o řád vyšší než v Na2SO4 a neklesá se vzrůstem tloušťky vrstvy. To může být přisouzeno silné adsorpci kyseliny šťavelové, která přímo oxidovaná dírami. (cs)
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| Title
| - Immobilised particulate TiO2 catalysts for degradation of organics pollutants. Effect of layer thickness
- Nanesený částicový TiO2 katalyzátor pro degradaci organických škodlivin. Vliv tloušťky vrstvy (cs)
- Immobilised particulate TiO2 catalysts for degradation of organics pollutants. Effect of layer thickness (en)
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| skos:prefLabel
| - Immobilised particulate TiO2 catalysts for degradation of organics pollutants. Effect of layer thickness
- Nanesený částicový TiO2 katalyzátor pro degradaci organických škodlivin. Vliv tloušťky vrstvy (cs)
- Immobilised particulate TiO2 catalysts for degradation of organics pollutants. Effect of layer thickness (en)
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| skos:notation
| - RIV/60461373:22310/05:00013701!RIV06-MSM-22310___
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| http://linked.open.../vavai/riv/strany
| |
| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(GA104/02/0662), Z(MSM6046137301)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/60461373:22310/05:00013701
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - TiO2; particulate layer; photocurrent; photodegradation; oxalic acid (en)
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| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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| http://linked.open...ontrolniKodProRIV
| |
| http://linked.open...i/riv/nazevZdroje
| |
| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
| |
| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...vavai/riv/projekt
| |
| http://linked.open...UplatneniVysledku
| |
| http://linked.open...v/svazekPeriodika
| |
| http://linked.open...iv/tvurceVysledku
| - Keppert, Martin
- Krýsa, Josef
- Jirkovský, Jakub
- Waldner, G.
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| http://linked.open...n/vavai/riv/zamer
| |
| issn
| |
| number of pages
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| http://localhost/t...ganizacniJednotka
| |
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