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  • This paper is focused on both the theoretical and experimental study of active particle penetration into a closed slot. Presented in this paper are layer profiles obtained through the plasma polymerization of acetylene on a specially developed substrate and the TiOx based layer profiles obtained by plasma enhanced chemical vapour deposition (PECVD) on a glass substrate. In the second part of the paper a computational fluid model is presented that was developed in order to gain insight into the overriding physical phenomena taking part during the deposition process. This model enables us to predict the layer profile on complicated three-dimensional substrates and to set up the optimal parameters during the layer deposition. The data obtained theoretically and experimentally are compared.
  • This paper is focused on both the theoretical and experimental study of active particle penetration into a closed slot. Presented in this paper are layer profiles obtained through the plasma polymerization of acetylene on a specially developed substrate and the TiOx based layer profiles obtained by plasma enhanced chemical vapour deposition (PECVD) on a glass substrate. In the second part of the paper a computational fluid model is presented that was developed in order to gain insight into the overriding physical phenomena taking part during the deposition process. This model enables us to predict the layer profile on complicated three-dimensional substrates and to set up the optimal parameters during the layer deposition. The data obtained theoretically and experimentally are compared. (en)
Title
  • Limited volume thin film deposition on geometrically complicated substrates
  • Limited volume thin film deposition on geometrically complicated substrates (en)
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  • Limited volume thin film deposition on geometrically complicated substrates
  • Limited volume thin film deposition on geometrically complicated substrates (en)
skos:notation
  • RIV/60076658:12410/09:00011372!RIV10-AV0-12410___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(KAN101120701)
http://linked.open...iv/cisloPeriodika
  • 2
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 323795
http://linked.open...ai/riv/idVysledku
  • RIV/60076658:12410/09:00011372
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • plasma deposition; computer simulations; geometrically complicated substrates (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [6CD833E30536]
http://linked.open...i/riv/nazevZdroje
  • European Physical Journal D
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 54
http://linked.open...iv/tvurceVysledku
  • Bartoš, Petr
  • Špatenka, Petr
  • Volfová, L.
http://linked.open...ain/vavai/riv/wos
  • 000268329200007
issn
  • 1434-6060
number of pages
http://localhost/t...ganizacniJednotka
  • 12410
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