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rdf:type
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Description
| - Parametry DC magnetronu v pulzním režimu byly studovány metodou Langmuirovské sondy. Výboj byl generován ve směsi Ar/O2. Byly určeny okamžité hodnoty plazmového potenciálu, a koncentrace a teploty elektronů v závislosti na puzní frekvenci. (cs)
- The dc planar magnetron, used for deposition of TiOx thin films, was operated in pulsed regime. The magnetron system was equipped by Ti target, discharge was created from mixture of Ar (19 sccm) and reactive admixture O2 (0.3 sccm). The repetition frequency was varied from 250 Hz up to 6.3 kHz with the same length of active part Tactive = 150 mikrosec. The average current was kept constant in all measurements at Iav = 550 mA. The generated plasma was investigated by time-resolved Langmuir probe measurements and time-resolved photon counting measurements. Plasma density, plasma potential, electron temperature and discharge current were main quantities of our interest.
- The dc planar magnetron, used for deposition of TiOx thin films, was operated in pulsed regime. The magnetron system was equipped by Ti target, discharge was created from mixture of Ar (19 sccm) and reactive admixture O2 (0.3 sccm). The repetition frequency was varied from 250 Hz up to 6.3 kHz with the same length of active part Tactive = 150 mikrosec. The average current was kept constant in all measurements at Iav = 550 mA. The generated plasma was investigated by time-resolved Langmuir probe measurements and time-resolved photon counting measurements. Plasma density, plasma potential, electron temperature and discharge current were main quantities of our interest. (en)
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Title
| - Investigation of pulsed magnetron discharge at different frequencies during deposition of TiOx thin films
- Studium pulzního magnetronového výboje za různých frekvencí během depozice TiOx tenkých vrstev (cs)
- Investigation of pulsed magnetron discharge at different frequencies during deposition of TiOx thin films (en)
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skos:prefLabel
| - Investigation of pulsed magnetron discharge at different frequencies during deposition of TiOx thin films
- Studium pulzního magnetronového výboje za různých frekvencí během depozice TiOx tenkých vrstev (cs)
- Investigation of pulsed magnetron discharge at different frequencies during deposition of TiOx thin films (en)
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skos:notation
| - RIV/60076658:12410/07:00008091!RIV08-GA0-12410___
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/60076658:12410/07:00008091
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - pulsed magnetron; plasma diagnostic; Langmuir probe (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - In: Matuška, J., Matějčík, S., Skalný, J.D. (ed.): Proceedings of SAPP XVI, 2007
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Adámek, Petr
- Blažek, Josef
- Hippler, R.
- Straňák, Vítězslav
- Tichý, Milan
- Hubička, Z.
- Virostko, P.
- Wrehde, S.
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number of pages
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http://purl.org/ne...btex#hasPublisher
| - Univerzita Komenského v Bratislave
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https://schema.org/isbn
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http://localhost/t...ganizacniJednotka
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