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Description
| - RF and DC plasma jet sputtering systems were investigated as a source for deposition of ZnO thin films. Deposited ZnO films have a strong orientation of hexagonal crystallities with 'c' axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150oC during the deposition. Langmuir probe measurement performed at the substrate revealed two group of electrons with approximate maxwellian distribution in the DC plasma jet and one maxwellian group in the case of RF plasma jet system. Electron concentration in the RF jet was about 5 109 - 1010 cm-3 with electron temperature 2.5 -3.5 eV. Concentration of cold electrons in the DC jet was usually 109 cm-3 with temperature 0.5 eV and hot electrons 108 cm-3 with temperature 2-3.5 eV. Photography also confirmed that plasma density is higher in the position of the substrate in the RF jet than in the DC jet. Other obtained macroscopic parameters as plasma potential, floating potential and DC voltage of the Zn nozzle relative to
- RF and DC plasma jet sputtering systems were investigated as a source for deposition of ZnO thin films. Deposited ZnO films have a strong orientation of hexagonal crystallities with 'c' axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150oC during the deposition. Langmuir probe measurement performed at the substrate revealed two group of electrons with approximate maxwellian distribution in the DC plasma jet and one maxwellian group in the case of RF plasma jet system. Electron concentration in the RF jet was about 5 109 - 1010 cm-3 with electron temperature 2.5 -3.5 eV. Concentration of cold electrons in the DC jet was usually 109 cm-3 with temperature 0.5 eV and hot electrons 108 cm-3 with temperature 2-3.5 eV. Photography also confirmed that plasma density is higher in the position of the substrate in the RF jet than in the DC jet. Other obtained macroscopic parameters as plasma potential, floating potential and DC voltage of the Zn nozzle relative to (en)
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Title
| - Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films
- Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films (en)
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skos:prefLabel
| - Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films
- Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films (en)
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skos:notation
| - RIV/60076658:12410/03:00004555!RIV/2004/MSM/124104/N
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/60076658:12410/03:00004555
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Langmuir probe measurement, RF, DC, deposition process (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - In: Surface and Coatings Technology
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...ocetUcastnikuAkce
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http://linked.open...nichUcastnikuAkce
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Adámek, Petr
- Jastrabík, L.
- Soukup, L.
- Ptáček, P.
- Hubička, Z.
- Čada, M.
- Šícha, Miloš
- Šíchová, H.
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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http://localhost/t...ganizacniJednotka
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