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Description
| - The paper deals with a special arrangement of pulsed laser deposition (PLD) when the substrates were cooled at cryogenic temperatures by liquid nitrogen during the deposition process. Applied materials - zinc oxide and titanium dioxide - play an important role in current optoelectronics and sensor research and a comparative study of their behaviour in presented PLD arrangements were performed. Prepared films (deposited on different substrates: Si (100) and sapphire) were investigated in as-deposited states and their properties in dependence of deposition temperature were compared. Investigation by X-ray diffraction and Raman spectroscopy proved their amorphous structure. Subsequently, annealing under different temperatures (up to 800°C) was applied and properties of modi?ed structures were compared by using different analytical methods (scanning electron microscopy, X-ray diffraction, Raman spectroscopy, optical absorption spectroscopy and spectroscopic ellipsometry).
- The paper deals with a special arrangement of pulsed laser deposition (PLD) when the substrates were cooled at cryogenic temperatures by liquid nitrogen during the deposition process. Applied materials - zinc oxide and titanium dioxide - play an important role in current optoelectronics and sensor research and a comparative study of their behaviour in presented PLD arrangements were performed. Prepared films (deposited on different substrates: Si (100) and sapphire) were investigated in as-deposited states and their properties in dependence of deposition temperature were compared. Investigation by X-ray diffraction and Raman spectroscopy proved their amorphous structure. Subsequently, annealing under different temperatures (up to 800°C) was applied and properties of modi?ed structures were compared by using different analytical methods (scanning electron microscopy, X-ray diffraction, Raman spectroscopy, optical absorption spectroscopy and spectroscopic ellipsometry). (en)
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Title
| - Pulsed laser deposition of thin films on actively cooled substrates
- Pulsed laser deposition of thin films on actively cooled substrates (en)
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skos:prefLabel
| - Pulsed laser deposition of thin films on actively cooled substrates
- Pulsed laser deposition of thin films on actively cooled substrates (en)
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skos:notation
| - RIV/49777513:23640/13:43918866!RIV14-MSM-23640___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23640/13:43918866
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - titanium oxide; zinc oxide; phase transition; amorphous structure; Pulsed laser deposition (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Bruncko, Jaroslav
- Michalka, Miroslav
- Netrvalová, Marie
- Vincze, Andrej
- Šutta, Pavol
- Uherek, František
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issn
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number of pages
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http://bibframe.org/vocab/doi
| - 10.1016/j.vacuum.2013.01.024
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http://localhost/t...ganizacniJednotka
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