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Description
| - High-power impulse magnetron sputtering of a planar Ta target in various Ar+O2+N2 gas mixtures was investigated. A strongly unbalanced magnetron was driven by a pulsed dc power supply at the average target power density in a pulse. Si (100) and glass substrates were at a floating potential, and the substrate temperatures were less than 285 °C. A pulsed reactive gas (O2 and N2) flow control made it possible to produce high-quality Ta-O-N films of various elemental compositions with high deposition rates of 97 - 190 nm/min. The film compositions (in at.%) were varied gradually from Ta28O71 with less than 1 at. % of H to Ta38O4N55 with 3 at. % of H. The Ta27O40N31 films with 2 at. % of H, which were produced with the highest deposition rate of 190 nm/min, were nanocrystalline with an optical band gap of 2.5 eV. These films with a shift of the absorption edge to 500 nm are potential candidates for application as visible-light driven photocatalysts.
- High-power impulse magnetron sputtering of a planar Ta target in various Ar+O2+N2 gas mixtures was investigated. A strongly unbalanced magnetron was driven by a pulsed dc power supply at the average target power density in a pulse. Si (100) and glass substrates were at a floating potential, and the substrate temperatures were less than 285 °C. A pulsed reactive gas (O2 and N2) flow control made it possible to produce high-quality Ta-O-N films of various elemental compositions with high deposition rates of 97 - 190 nm/min. The film compositions (in at.%) were varied gradually from Ta28O71 with less than 1 at. % of H to Ta38O4N55 with 3 at. % of H. The Ta27O40N31 films with 2 at. % of H, which were produced with the highest deposition rate of 190 nm/min, were nanocrystalline with an optical band gap of 2.5 eV. These films with a shift of the absorption edge to 500 nm are potential candidates for application as visible-light driven photocatalysts. (en)
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Title
| - High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties
- High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties (en)
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skos:prefLabel
| - High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties
- High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties (en)
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skos:notation
| - RIV/49777513:23520/14:43922535!RIV15-GA0-23520___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/14:43922535
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - Hardness; Electrical conductivity; Optical properties; Tunable properties; Ta-O-N; High deposition rates; Reactive HiPIMS (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Houška, Jiří
- Vlček, Jaroslav
- Rezek, Jiří
- Čerstvý, Radomír
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http://linked.open...ain/vavai/riv/wos
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issn
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number of pages
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http://bibframe.org/vocab/doi
| - 10.1016/j.tsf.2014.07.033
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http://localhost/t...ganizacniJednotka
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