About: Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films

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About: Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films Goto Sponge NotDistinct Permalink

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Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1016/j.surfcoat.2013.10.052
Description	High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified stoichiometric ZrO2 and Ta2O5 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium or tantalum target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the average target power density from 5 W/cm^2 to 103 W/cm^2 during a deposition. The duty cycles ranged from 2.5 % to 10 %. The target-to-substrate distance was 100 mm. For the same duty cycle of 10 %, the deposition rates were up to 140 nm/min for the ZrO2 films and up to 345 nm/min for the Ta2O5 films. The ZrO2 films were crystalline. They exhibited a refractive index of 2.19 - 2.22 and an extinction coefficient of 0.002 - 0.006. The Ta2O5 films were nanocrystalline. They exhibited a refractive index of 2.09 - 2.15 and an extinction coefficient of less than 0.0001. High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified stoichiometric ZrO2 and Ta2O5 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium or tantalum target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the average target power density from 5 W/cm^2 to 103 W/cm^2 during a deposition. The duty cycles ranged from 2.5 % to 10 %. The target-to-substrate distance was 100 mm. For the same duty cycle of 10 %, the deposition rates were up to 140 nm/min for the ZrO2 films and up to 345 nm/min for the Ta2O5 films. The ZrO2 films were crystalline. They exhibited a refractive index of 2.19 - 2.22 and an extinction coefficient of 0.002 - 0.006. The Ta2O5 films were nanocrystalline. They exhibited a refractive index of 2.09 - 2.15 and an extinction coefficient of less than 0.0001. (en)
Title	Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films (en)
skos:prefLabel	Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films (en)
skos:notation	RIV/49777513:23520/13:43920009!RIV14-GA0-23520___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GAP108/12/0393)
http://linked.open...iv/cisloPeriodika	236
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Houška, Jiří Vlček, Jaroslav Rezek, Jiří Čerstvý, Radomír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	99949
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/13:43920009
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	High optical transparency; Densified films; Ta2O5; ZrO2; High deposition rates; Reactive HiPIMS (en)
http://linked.open.../riv/klicoveSlovo	Densified films High deposition rates High optical transparency Reactive HiPIMS ZrO2 Ta2O5
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[87B63F717515]
http://linked.open...i/riv/nazevZdroje	Surface & Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Hard nanocomposite coatings with enhanced toughness and unique properties
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	2013
http://linked.open...iv/tvurceVysledku	Houška, Jiří Vlček, Jaroslav Rezek, Jiří Čerstvý, Radomír Bugyi, Rafal
http://linked.open...ain/vavai/riv/wos	000329884300074
issn	0257-8972
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2013.10.052
http://localhost/t...ganizacniJednotka	23520

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