About: Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges     Goto   Sponge   NotDistinct   Permalink

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Description
  • We use a non-stationary two-zone model to verify predictions of a steady-state phenomenological model (Vlček and Burcalová) under the conditions in typical high-power impulse magnetron sputtering discharges. It is shown that the steady-state phenomenological model provides a reliable description of fundamental deposition parameters characterizing efficiency of magnetron sputtering and the transfer of target material ions to the substrate in these discharges with relatively long steady-state discharge regimes established during pulses. Based on the results, we recommend to lower the magnetic field strength in a magnetron system at a fixed average target power density in a pulse and thereby use a higher magnetron voltage in order to enhance the deposition rate and keep or even increase the ionized fraction of sputtered target material atoms in the flux onto the substrate.
  • We use a non-stationary two-zone model to verify predictions of a steady-state phenomenological model (Vlček and Burcalová) under the conditions in typical high-power impulse magnetron sputtering discharges. It is shown that the steady-state phenomenological model provides a reliable description of fundamental deposition parameters characterizing efficiency of magnetron sputtering and the transfer of target material ions to the substrate in these discharges with relatively long steady-state discharge regimes established during pulses. Based on the results, we recommend to lower the magnetic field strength in a magnetron system at a fixed average target power density in a pulse and thereby use a higher magnetron voltage in order to enhance the deposition rate and keep or even increase the ionized fraction of sputtered target material atoms in the flux onto the substrate. (en)
Title
  • Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges
  • Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges (en)
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  • Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges
  • Transport and ionization of sputtered atoms in high-power impulse magnetron sputtering discharges (en)
skos:notation
  • RIV/49777513:23520/13:43917963!RIV14-GA0-23520___
http://linked.open...avai/riv/aktivita
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  • P(GAP108/12/0393)
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  • 10
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  • 111665
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  • RIV/49777513:23520/13:43917963
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  • Magnetic field; Deposition rate; Non-stationary model; HiPIMS; High-power magnetron sputtering (en)
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  • GB - Spojené království Velké Británie a Severního Irska
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  • [18E89FE7D316]
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  • Journal of Physics D: Applied Physics
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  • 46
http://linked.open...iv/tvurceVysledku
  • Kos, Šimon
  • Kozák, Tomáš
  • Vlček, Jaroslav
http://linked.open...ain/vavai/riv/wos
  • 000315169500013
issn
  • 0022-3727
number of pages
http://bibframe.org/vocab/doi
  • 10.1088/0022-3727/46/10/105203
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  • 23520
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