About: Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering

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About: Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripes which covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) and even higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistance in air up to 650 Celsius degrees, while the latter to 550 Celsius degrees. Hard Zr-B-C-(N) films were deposited on Si(100) substrates by pulsed magnetron co-sputtering of a single boron carbide-zirconium target in various nitrogen-argon gas mixtures. The target was formed by a boron carbide plate overlapped by zirconium stripes which covered 15 or 45 % of the target erosion area. The nitrogen fractions in the gas mixture were in the range from 0 to 50 % at the total pressure of the gas mixture of 0.5 Pa. Hard (37 GPa) nanocrystalline Zr-B-C-N films with very low compressive stress (0.4 GPa) and high electrical conductivity (resistivity of 2.3 microohmmeter) were deposited in argon discharge at the 15 % Zr fraction in the target erosion area. Hard (37 GPa) nanocomposite Zr-B-C-N films with low compressive stress (0.6 GPa) and even higher electrical conductivity (resistivity of 1.7 microohmmeter) were deposited at the 45 % Zr fraction in the target erosion area and 5 % nitrogen fraction in the gas mixture. The former films exhibited very high oxidation resistance in air up to 650 Celsius degrees, while the latter to 550 Celsius degrees. (en)
Title	Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering (en)
skos:prefLabel	Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering Hard nanocrystalline Zr-B-C-N films with high electrical conductivity prepared by pulsed magnetron sputtering (en)
skos:notation	RIV/49777513:23520/13:43917535!RIV14-MSM-23520___
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED1.1.00/02.0090), P(OC10045)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Zeman, Petr Kohout, Jiří Vlček, Jaroslav Čerstvý, Radomír Steidl, Petr Prokšová, Šárka
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	77049
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/13:43917535
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Oxidation resistance; Pulsed magnetron sputtering; Electrical conductivity; Hardness; Nanocrystalline Zr-B-C-N films (en)
http://linked.open.../riv/klicoveSlovo	Electrical conductivity Hardness Nanocrystalline Zr-B-C-N films Oxidation resistance Pulsed magnetron sputtering
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[26D5388698F8]
http://linked.open...i/riv/nazevZdroje	Surface & Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	NTIS - New Technologies for Information Society Novel plasma sources for film deposition and surface modification
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	215
http://linked.open...iv/tvurceVysledku	Zeman, Petr Vlček, Jaroslav Peřina, Vratislav Čerstvý, Radomír Steidl, Petr Kohout, Jiří Prokšová, Šárka
http://linked.open...ain/vavai/riv/wos	000315659600027
issn	0257-8972
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2012.08.084
http://localhost/t...ganizacniJednotka	23520

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