About: Overview of optical properties of Al2O3 films prepared by various techniques

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://www.sciencedirect.com/science/article/pii/S004060901200404X
Description	We study optical properties of Al2O3 films prepared by various techniques using spectroscopic ellipsometry. The film preparation techniques include conventional pulsed magnetron sputtering in various gas mixtures, high power impulse magnetron sputtering, annealing of as-deposited Al2O3 in an inert atmosphere and annealing of as-deposited Al in air. We focus on the effect of the preparation technique, deposition parameters and annealing temperature on the refractive index, n, and extinction coefficient, k, of stoichiometric Al2O3. At a wavelength of 550 nm we find n of 1.50-1.67 for amorphous deposited Al2O3, 1.65-1.67 for amorphous Al2O3 obtained by Al annealing, 1.46-1.69 for gama- Al2O3 and decreasing n for Al2O3 annealing temperature increasing up to 890 °C. The results facilitate correct interpretation of optical characterization of Al2O3, as well as selection of a preparation technique corresponding to a required Al2O3 structure and properties. We study optical properties of Al2O3 films prepared by various techniques using spectroscopic ellipsometry. The film preparation techniques include conventional pulsed magnetron sputtering in various gas mixtures, high power impulse magnetron sputtering, annealing of as-deposited Al2O3 in an inert atmosphere and annealing of as-deposited Al in air. We focus on the effect of the preparation technique, deposition parameters and annealing temperature on the refractive index, n, and extinction coefficient, k, of stoichiometric Al2O3. At a wavelength of 550 nm we find n of 1.50-1.67 for amorphous deposited Al2O3, 1.65-1.67 for amorphous Al2O3 obtained by Al annealing, 1.46-1.69 for gama- Al2O3 and decreasing n for Al2O3 annealing temperature increasing up to 890 °C. The results facilitate correct interpretation of optical characterization of Al2O3, as well as selection of a preparation technique corresponding to a required Al2O3 structure and properties. (en)
Title	Overview of optical properties of Al2O3 films prepared by various techniques Overview of optical properties of Al2O3 films prepared by various techniques (en)
skos:prefLabel	Overview of optical properties of Al2O3 films prepared by various techniques Overview of optical properties of Al2O3 films prepared by various techniques (en)
skos:notation	RIV/49777513:23520/12:43915253!RIV13-MSM-23520___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(ED1.1.00/02.0090), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika	16
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Houška, Jiří Rezek, Jiří Blažek, Jakub Prokšová, Šárka
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	157486
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/12:43915253
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Annealing; High power impulse magnetron sputtering; Magnetron sputtering; Refractive index; Optical properties; Aluminum oxide (en)
http://linked.open.../riv/klicoveSlovo	Annealing Magnetron sputtering Refractive index Optical properties Aluminum oxide High power impulse magnetron sputtering
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[CA421A960F3D]
http://linked.open...i/riv/nazevZdroje	Thin Solid Films
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	NTIS - New Technologies for Information Society
http://linked.open...UplatneniVysledku	2012
http://linked.open...v/svazekPeriodika	520
http://linked.open...iv/tvurceVysledku	Houška, Jiří Rezek, Jiří Blažek, Jakub Prokšová, Šárka
http://linked.open...ain/vavai/riv/wos	000305719000053
http://linked.open...n/vavai/riv/zamer	Procesy ve výbojovém plazmatu a nové tenkovrstvé materiály s unikátními vlastnostmi
issn	0040-6090
number of pages	8 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.tsf.2012.03.113
http://localhost/t...ganizacniJednotka	23520

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