About: Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron     Goto   Sponge   NotDistinct   Permalink

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  • The article reports on the effect of the addition of Cu in the Al2O3 film on its mechanical and optical properties. The Al-Cu-O films were reactively co-sputtered using DC pulse dual magnetron in a mixture of argon and oxygen. The amount of Al and Cu in the Al-Cu-O film was controlled by the length of pulse at the Al/Cu target. It is shown that the structure of Al-Cu-O film gradually varies with increasing Cu content from Al2O3 through Al-Cu-O nanocrystalline solid solution to CuAl2O4 spinel structure. The Al-Cu-O films exhibit (i) relatively high hardness (ii) enhanced elastic recovery (iii) low values of Young's modulus and (iv) enhanced resistance to cracking during indentation under high load.
  • The article reports on the effect of the addition of Cu in the Al2O3 film on its mechanical and optical properties. The Al-Cu-O films were reactively co-sputtered using DC pulse dual magnetron in a mixture of argon and oxygen. The amount of Al and Cu in the Al-Cu-O film was controlled by the length of pulse at the Al/Cu target. It is shown that the structure of Al-Cu-O film gradually varies with increasing Cu content from Al2O3 through Al-Cu-O nanocrystalline solid solution to CuAl2O4 spinel structure. The Al-Cu-O films exhibit (i) relatively high hardness (ii) enhanced elastic recovery (iii) low values of Young's modulus and (iv) enhanced resistance to cracking during indentation under high load. (en)
Title
  • Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron
  • Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron (en)
skos:prefLabel
  • Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron
  • Properties of nanocrystalline Al-Cu-O films reactively sputtered by DC pulse dual magnetron (en)
skos:notation
  • RIV/49777513:23520/11:43898490!RIV12-MSM-23520___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(OC10045), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 258
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 224681
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/11:43898490
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Pulse reactive sputtering; Resistance to cracking; Elasticity; Mechanical properties; Cu addition; Al2O3-based films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [7F51C8B9041E]
http://linked.open...i/riv/nazevZdroje
  • APPLIED SURFACE SCIENCE
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 2011
http://linked.open...iv/tvurceVysledku
  • Houška, Jiří
  • Musil, Jindřich
  • Čerstvý, Radomír
  • Blažek, Jakub
  • Stupka, Petr
http://linked.open...n/vavai/riv/zamer
issn
  • 0169-4332
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.apsusc.2011.10.039
http://localhost/t...ganizacniJednotka
  • 23520
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