About: High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	High-power pulsed dc magnetron sputtering with an effective reactive gas flow control, developed by us, was used for the reactive deposition of transparent zirconium dioxide films. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 2.5% to 10%. The substrate temperatures were less than 300 degrees of Celsius during the depositions of films on a floating substrate at the distance of 100 mm from the target. The increase in the average target power density from 5 to 100 watts per square centimeter in a period at the same duty cycle of 10% resulted in a rapid rise in the deposition rate from 11 nm/min to 73 nm/min. High-power pulsed dc magnetron sputtering with an effective reactive gas flow control, developed by us, was used for the reactive deposition of transparent zirconium dioxide films. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 2.5% to 10%. The substrate temperatures were less than 300 degrees of Celsius during the depositions of films on a floating substrate at the distance of 100 mm from the target. The increase in the average target power density from 5 to 100 watts per square centimeter in a period at the same duty cycle of 10% resulted in a rapid rise in the deposition rate from 11 nm/min to 73 nm/min. (en)
Title	High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering (en)
skos:prefLabel	High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering High-Rate Reactive Deposition of Transparent Zirconium Dioxide Films Using High-Power Pulsed DC Magnetron Sputtering (en)
skos:notation	RIV/49777513:23520/11:43895686!RIV12-MSM-23520___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(OC10045), Z(MSM4977751302)
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Houška, Jiří Vlček, Jaroslav Rezek, Jiří Lazar, Jan Čerstvý, Radomír
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	202088
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/11:43895686
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Zirconium dioxide; HiPIMS; Reactive sputtering; High-rate reactive deposition (en)
http://linked.open.../riv/klicoveSlovo	HiPIMS Reactive sputtering High-rate reactive deposition Zirconium dioxide
http://linked.open...ontrolniKodProRIV	[D55602B3B3A7]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Novel plasma sources for film deposition and surface modification
http://linked.open...UplatneniVysledku	2011
http://linked.open...iv/tvurceVysledku	Houška, Jiří Vlček, Jaroslav Lazar, Jan Rezek, Jiří Čerstvý, Radomír
http://linked.open...n/vavai/riv/zamer	Procesy ve výbojovém plazmatu a nové tenkovrstvé materiály s unikátními vlastnostmi
http://localhost/t...ganizacniJednotka	23520

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 25 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software