About: Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
Description
  • The paper reports molecular-dynamics simulations of particle-by-particle deposition process amorphous SiNH films prepared by plasma-enhanced chemical vapor deposition from SiHx and N radicals. We observe formation of a mixed zone (damaged layer) in the initial stages of film growth, and formation of nanopores in the film bulk. We investigate the effect of various process parameters on both (1) deposition characteristics, such as sticking coefficients, and (2) material characteristics, such as dimension of the nanopores formed. The results provide detailed insight into the complex relationships between the process parameters and the characteristics of the deposited SiNH materials and exhibit an excellent agreement with the experimentally observed results.
  • The paper reports molecular-dynamics simulations of particle-by-particle deposition process amorphous SiNH films prepared by plasma-enhanced chemical vapor deposition from SiHx and N radicals. We observe formation of a mixed zone (damaged layer) in the initial stages of film growth, and formation of nanopores in the film bulk. We investigate the effect of various process parameters on both (1) deposition characteristics, such as sticking coefficients, and (2) material characteristics, such as dimension of the nanopores formed. The results provide detailed insight into the complex relationships between the process parameters and the characteristics of the deposited SiNH materials and exhibit an excellent agreement with the experimentally observed results. (en)
Title
  • Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride
  • Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride (en)
skos:prefLabel
  • Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride
  • Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride (en)
skos:notation
  • RIV/49777513:23520/10:00503473!RIV11-MSM-23520___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 8
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 248044
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/10:00503473
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • SiNH; molecular dynamics; PECVD; sticking coefficient; porosity (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [4824D4EAAB73]
http://linked.open...i/riv/nazevZdroje
  • Journal of Applied Physics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 107
http://linked.open...iv/tvurceVysledku
  • Houška, Jiří
  • Martinů, Ludvík
  • Klemberg-Sapieha, Jolanta Eva
http://linked.open...ain/vavai/riv/wos
  • 000277303200022
http://linked.open...n/vavai/riv/zamer
issn
  • 0021-8979
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software