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Description
  • Krystalizace amorfních vrstev TiO2 o různých tloušťkách deponovaných na křemíkové substráty byla zkoumána pomocí in-situ izochronního a izotermického žíhání ve vysokoteplotní komoře v rtg difraktometru. Bylo zjištěno, že krystalizace silně závisí na tloušťce vrstvy, obzvláště pro tloušťky pod 500nm, kde krystalizace je velmi pomalá pro velmi tenké vrstvy. Proces může být velmi dobře popsán Avramiho rovnicí modifikovanou počátečním časem krystalizace. Všechny parametry rovnice se mění s tloušťkou vrstvy. (cs)
  • Crystallization of amorphous titanium dioxide films with different thickness (50-100 nm) deposited on silicon substrates was investigated by in-situ isochronal and isothermal annealing inhigh-temperature chamber in the X-ray diffractometer. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thinfilms. The process can be well described by the Avrami equation modified by the initial time of crystallization. All the parameters of the equation vary with thin thickness.
  • Crystallization of amorphous titanium dioxide films with different thickness (50-100 nm) deposited on silicon substrates was investigated by in-situ isochronal and isothermal annealing inhigh-temperature chamber in the X-ray diffractometer. It was found that the crystallization depends strongly on the film thickness, especially below about 500 nm and it is slow for very thinfilms. The process can be well described by the Avrami equation modified by the initial time of crystallization. All the parameters of the equation vary with thin thickness. (en)
Title
  • XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films
  • XRD in-situ studie krystalizace magnetronově nanášených tenkých vrstev TiO2 (cs)
  • XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films (en)
skos:prefLabel
  • XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films
  • XRD in-situ studie krystalizace magnetronově nanášených tenkých vrstev TiO2 (cs)
  • XRD in-situ study of crystallization of magnetron-deposited TiO2 thin films (en)
skos:notation
  • RIV/49777513:23520/08:00500791!RIV09-MSM-23520___
http://linked.open...avai/riv/aktivita
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  • P(GA106/06/0327), Z(MSM4977751302)
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  • 405961
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  • RIV/49777513:23520/08:00500791
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  • TiO2; crystallization; post-annealing; in-situ XRD (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [320F78867D15]
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  • Ghent
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  • Ghent
http://linked.open...i/riv/nazevZdroje
  • Proceedings of ICTF 14 & RSD2008
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http://linked.open...vavai/riv/projekt
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http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Šícha, Jan
  • Kužel, Radomír
  • Nichtová, L.
http://linked.open...vavai/riv/typAkce
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number of pages
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  • Ghent University
https://schema.org/isbn
  • 978-90-334-7347-0
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  • 23520
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