About: High-power pulsed sputtering using a magnetron with enhanced plasma confinement     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
Description
  • High-power pulsed dc magnetron discharges for ionized high-rate sputtering of metallic films were systematically investigated. The depositions were performed using two unbalanced circular magnetrons of different types with a directly water-cooled planar copper target of 100mm in diameter. The repetition frequency was 1kHz at a fixed 20% duty cycle and an argon pressure of 0.5Pa. Time evolutions of the discharge characteristics were measured to provide information on absorption of energy in the discharge plasma and on transfer of arising ions to the substrate at a target power density in a pulse up to 950 W/cm2.
  • High-power pulsed dc magnetron discharges for ionized high-rate sputtering of metallic films were systematically investigated. The depositions were performed using two unbalanced circular magnetrons of different types with a directly water-cooled planar copper target of 100mm in diameter. The repetition frequency was 1kHz at a fixed 20% duty cycle and an argon pressure of 0.5Pa. Time evolutions of the discharge characteristics were measured to provide information on absorption of energy in the discharge plasma and on transfer of arising ions to the substrate at a target power density in a pulse up to 950 W/cm2. (en)
  • Byly zkoumány vysokovýkonové magnetronové výboje pro vysokorychlostní naprašování vrstev mědi. Opakovací frekvence byla 1kHz při dvacetiprocentním využití pulzní periody a tlaku argonu 0.5Pa. Bylo dosaženo velmi vysoké depoziční rychlosti 2 mikrometry/min a vysokého podílu iontů mědi (až 92%)v celkovém toku iontů na substrát. Trendy naměřených hodnot pro depoziční rychlost vztaženou na jednotku výkonové zátěže a pro podíl iontů rozprašovaných částic v celkovém toku částic terčového materiálu na substrát (až 56%) byly objasněny na základě modelových predikcí. (cs)
Title
  • High-power pulsed sputtering using a magnetron with enhanced plasma confinement
  • Vysokovýkonové pulzní naprašování pomocí magnetronu se zesíleným omezením plazmatu (cs)
  • High-power pulsed sputtering using a magnetron with enhanced plasma confinement (en)
skos:prefLabel
  • High-power pulsed sputtering using a magnetron with enhanced plasma confinement
  • Vysokovýkonové pulzní naprašování pomocí magnetronu se zesíleným omezením plazmatu (cs)
  • High-power pulsed sputtering using a magnetron with enhanced plasma confinement (en)
skos:notation
  • RIV/49777513:23520/07:00000242!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 42
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ME 673), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 424155
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/07:00000242
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • high-power pulsed magnetron; high-rate deposition; highly ionized fluxes; mass spectroscopy; model predictions (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [EE8C3D30D0AB]
http://linked.open...i/riv/nazevZdroje
  • Journal of Vacuum Science and Technology A
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Vlček, Jaroslav
  • Kudláček, Pavel
  • Burcalová, Kristýna
http://linked.open...n/vavai/riv/zamer
issn
  • 0734-2101
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software