Attributes | Values |
---|
rdf:type
| |
Description
| - Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling measurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate.
- Two sets of nanocrystalline TiO2 thin films magnetron deposited on glass and silicon substrates have been studied by X-ray scattering and measurements of contact angle of water drop on the film surface. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. By both thickness dependence of XRD patterns and depth profiling measurements it was found that rutile growths on the substrate and it is transformed to anatase with increasing distance from the substrate. (en)
- Byly provedeny analýzy vlivu tlousťky vrstev TiO2 na jejich fázové složení a hydrofilicitní chování charakterizované poklesem kontaktního úhlu mezi vodou a povrchem vrstev. S využitím XRD analýzy bylo podrobně analyzováno fázové složení, zbytkový stress a na základě reflexe XRD záření byla určena povrchová morfologie připravených vrstev. Bylo zjištěno, že vysokoteplotní krystalová fáze TiO2 rutil je přítomna na rozhraní vrstva substrát a směrem k povrchu vrstvy je transformována na krystalovou fázi anatázu. (cs)
|
Title
| - Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering
- Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering (en)
- XRD studie růstu vrstev TiO2 připravených magnetronovým naprašováním (cs)
|
skos:prefLabel
| - Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering
- Growth of magnetron sputtered TiO2 thin films studied by X-ray scattering (en)
- XRD studie růstu vrstev TiO2 připravených magnetronovým naprašováním (cs)
|
skos:notation
| - RIV/49777513:23520/07:00000207!RIV08-MSM-23520___
|
http://linked.open.../vavai/riv/strany
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| - P(GA106/06/0327), Z(MSM0021620834), Z(MSM4977751302)
|
http://linked.open...iv/cisloPeriodika
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/07:00000207
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - titanium oxide; thin film growth; X-ray diffraction; thin films (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...odStatuVydavatele
| - DE - Spolková republika Německo
|
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...i/riv/nazevZdroje
| - Zeitschrift für Kristallographie
|
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...iv/tvurceVysledku
| - Heřman, David
- Musil, Jindřich
- Šícha, Jan
- Kužel, Radomír
- Nichtová, L.
|
http://linked.open...n/vavai/riv/zamer
| |
issn
| |
number of pages
| |
http://localhost/t...ganizacniJednotka
| |