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Description
  • Byl studován vliv teploty žíhání na krystalizaci amorfních vrstev TiO2 s tloušťkou v rozsahu h=54 – 2000 nm připravených na skleněné a Si substráty. S využitím XRD analýzy byly sledovány změny fázového složení, parametrů krystalové mříže, zbytkového stresu a povrchové morfologie. Bylo zjišteno, že vrstvy TiO2 krystalizují při teplotě T=250°C a u nejtenčích vrstev je krystalizační teplota vyšší. (cs)
  • Crystallization of a set of magnetron deposited TiO2 thin films with different thickness in the range of 54-2000nm has been studied by X-ray scattering. Phase analysis, lattice parameters and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. As-deposited films were amorphous. They were annealed at different temperatures and found to be crystalline after annealing at 250°C except the thinnest films which crystallized at higher temperatures.
  • Crystallization of a set of magnetron deposited TiO2 thin films with different thickness in the range of 54-2000nm has been studied by X-ray scattering. Phase analysis, lattice parameters and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. As-deposited films were amorphous. They were annealed at different temperatures and found to be crystalline after annealing at 250°C except the thinnest films which crystallized at higher temperatures. (en)
Title
  • Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering
  • Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering (en)
  • XRD studie krystalizace vrstev TiO2 připravených magnetronovým naprašováním (cs)
skos:prefLabel
  • Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering
  • Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering (en)
  • XRD studie krystalizace vrstev TiO2 připravených magnetronovým naprašováním (cs)
skos:notation
  • RIV/49777513:23520/07:00000158!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 247
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA106/06/0327), Z(MSM0021620834), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 453243
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/07:00000158
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • titanium oxide; crystallization; X-ray diffraction; thin films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [E9135C612EDE]
http://linked.open...i/riv/nazevZdroje
  • Zeitschrift für Kristallographie
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Heřman, David
  • Musil, Jindřich
  • Šícha, Jan
  • Kužel, Radomír
  • Nichtová, L.
  • Matěj, Z.
http://linked.open...n/vavai/riv/zamer
issn
  • 0044-2968
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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