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rdf:type
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Description
| - Byl studován vliv teploty žíhání na krystalizaci amorfních vrstev TiO2 s tloušťkou v rozsahu h=54 – 2000 nm připravených na skleněné a Si substráty. S využitím XRD analýzy byly sledovány změny fázového složení, parametrů krystalové mříže, zbytkového stresu a povrchové morfologie. Bylo zjišteno, že vrstvy TiO2 krystalizují při teplotě T=250°C a u nejtenčích vrstev je krystalizační teplota vyšší. (cs)
- Crystallization of a set of magnetron deposited TiO2 thin films with different thickness in the range of 54-2000nm has been studied by X-ray scattering. Phase analysis, lattice parameters and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. As-deposited films were amorphous. They were annealed at different temperatures and found to be crystalline after annealing at 250°C except the thinnest films which crystallized at higher temperatures.
- Crystallization of a set of magnetron deposited TiO2 thin films with different thickness in the range of 54-2000nm has been studied by X-ray scattering. Phase analysis, lattice parameters and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics, the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. As-deposited films were amorphous. They were annealed at different temperatures and found to be crystalline after annealing at 250°C except the thinnest films which crystallized at higher temperatures. (en)
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Title
| - Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering
- Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering (en)
- XRD studie krystalizace vrstev TiO2 připravených magnetronovým naprašováním (cs)
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skos:prefLabel
| - Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering
- Study of crystallization of magnetron sputtered TiO2 thin films by X-ray scattering (en)
- XRD studie krystalizace vrstev TiO2 připravených magnetronovým naprašováním (cs)
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skos:notation
| - RIV/49777513:23520/07:00000158!RIV08-MSM-23520___
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(GA106/06/0327), Z(MSM0021620834), Z(MSM4977751302)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/07:00000158
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - titanium oxide; crystallization; X-ray diffraction; thin films (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
| - DE - Spolková republika Německo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Zeitschrift für Kristallographie
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Heřman, David
- Musil, Jindřich
- Šícha, Jan
- Kužel, Radomír
- Nichtová, L.
- Matěj, Z.
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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http://localhost/t...ganizacniJednotka
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