About: Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films     Goto   Sponge   NotDistinct   Permalink

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  • Electron energy distribution function and local plasma parameters were investigated at the substrate position (100mm from the target) by means of time-resolved Langmuir probe diagnostics during high-power pulsed dc magnetron sputtering of copper films. Very high plasma densities were achieved at the voltage pulse repetition frequency, the pulse duration, the argon pressure and the average pulse current. At the same conditions, the kinetic temperature of electrons rose with an increasing power during a pulse. After an initial stage it was in the range 10500-12500K. Negative peaks of the floating potential were registered at the very beginning of the voltage pulse
  • Electron energy distribution function and local plasma parameters were investigated at the substrate position (100mm from the target) by means of time-resolved Langmuir probe diagnostics during high-power pulsed dc magnetron sputtering of copper films. Very high plasma densities were achieved at the voltage pulse repetition frequency, the pulse duration, the argon pressure and the average pulse current. At the same conditions, the kinetic temperature of electrons rose with an increasing power during a pulse. After an initial stage it was in the range 10500-12500K. Negative peaks of the floating potential were registered at the very beginning of the voltage pulse (en)
  • Elektronové rozdělovací funkce podle energie a lokální plazmové parametry byly zkoumány v pozici u substrátu (100mm od terče) pomocí časově rozlišené diagnostiky Langmuirovou sondou během vysokovýkonového pulzního dc magnetronového naprašování měděných vrstev. Velmi vysokých hustot plazmatu (až 2.1012cm-3) bylo dosaženo při opakovací frekvenci pulzů napětí fr=1kHz, délce pulzu t1=200μs, tlaku argonu p=1Pa a průměrném proudu v pulzu Ida=50A. Při stejných podmínkách kinetická energie elektronů rostla s rostoucím výkonem během pulzu. Po iniciační fázi byla v intervalu 10500-12500K. Na začátku pulzu byly zaznamenány poklesy plovoucího potenciálu plazmatu. (cs)
Title
  • Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films
  • Časově rozlišená diagnostika Langmuirovou sondou ve vysokovýkonových pulzních dc magnetonových výbojích během depozice měděných vrstev (cs)
  • Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films (en)
skos:prefLabel
  • Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films
  • Časově rozlišená diagnostika Langmuirovou sondou ve vysokovýkonových pulzních dc magnetonových výbojích během depozice měděných vrstev (cs)
  • Time-resolved Langmuir probe diagnostics of high-power pulsed dc magnetron discharges during deposition of copper films (en)
skos:notation
  • RIV/49777513:23520/07:00000152!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 1960-1962
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ME 673), Z(MSM4977751302)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 455209
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  • RIV/49777513:23520/07:00000152
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • high-power magnetron; pulsed magnetron; magnetron deposition; Langmuir probe diagnostics (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [C97B8C7E9B41]
http://linked.open...v/mistoKonaniAkce
  • Praha
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  • Praha
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  • XXVIII International conference on phenomena in ionized gases
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http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Pajdarová, Andrea Dag
  • Vlček, Jaroslav
  • Lukáš, Jan
  • Kudláček, Pavel
http://linked.open...vavai/riv/typAkce
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number of pages
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  • Ústav fyziky plazmatu AV ČR
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  • 978-80-87026-01-4
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  • 23520
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