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  • The article deals with oxidation of Cu films during post-deposition thermal annealing in flowing air. Cu films were sputtered from a pure Cu target in Ar using dc unbalanced magnetron. The copper oxide films formed during post-deposition thermal annealing were compared with CuOx films sputtered from Cu target in the mixture of Ar and O2. The oxidation behavior of the films was characterized by high-temperature thermogravimetry and X-ray diffraction. Thermal annealing was carried out in a wide range of temperatures from 300 to 1300°C. It was found that the CuO oxide decomposes into Cu2O+O at 1040°C.
  • The article deals with oxidation of Cu films during post-deposition thermal annealing in flowing air. Cu films were sputtered from a pure Cu target in Ar using dc unbalanced magnetron. The copper oxide films formed during post-deposition thermal annealing were compared with CuOx films sputtered from Cu target in the mixture of Ar and O2. The oxidation behavior of the films was characterized by high-temperature thermogravimetry and X-ray diffraction. Thermal annealing was carried out in a wide range of temperatures from 300 to 1300°C. It was found that the CuO oxide decomposes into Cu2O+O at 1040°C. (en)
  • Článek se zabývá oxidací Cu vrstev během podepozičního žíhání v proudícím vzduchu. Cu vrstvy byly naprášeny pomocí dc nevyváženého magnetronu z Cu terčů v Ar atmosféře. Vrstvy oxidů mědi vzniklé během podepozičního tepelného žíhání byly srovnány s CuOx vrstvami naprášenými z Cu terčů ve směsi Ar a O2. Oxidační chování vrstev bylo charakterizováno pomocí vysokoteplotní termogravimetrie a rentgenové difrakce (XRD). Vrstvy byly žíhány v širokém rozsahu teplot od 300 do 1300°C. Bylo zjištěno, že CuO se rozpadá na Cu2O+O za teplot ~ 1040°C. (cs)
Title
  • Oxidation of sputtered Cu films during thermal annealing in flowing air
  • Oxidation of sputtered Cu films during thermal annealing in flowing air (en)
  • Oxidace naprášených Cu vrstev během tepelného žíhání v proudícím vzduchu (cs)
skos:prefLabel
  • Oxidation of sputtered Cu films during thermal annealing in flowing air
  • Oxidation of sputtered Cu films during thermal annealing in flowing air (en)
  • Oxidace naprášených Cu vrstev během tepelného žíhání v proudícím vzduchu (cs)
skos:notation
  • RIV/49777513:23520/07:00000149!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 711-712
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM4977751302)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
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  • 440385
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/07:00000149
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • magnetron sputtering; copper; thin films; thermogravimetry; oxidation (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [80D302F7587F]
http://linked.open...v/mistoKonaniAkce
  • Praha
http://linked.open...i/riv/mistoVydani
  • Prague
http://linked.open...i/riv/nazevZdroje
  • XXVIII International conference on phenomena in ionized gases
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Zeman, Petr
  • Šašek, Martin
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • Ústav fyziky plazmatu AV ČR
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  • 978-80-87026-01-4
http://localhost/t...ganizacniJednotka
  • 23520
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