About: Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air     Goto   Sponge   NotDistinct   Permalink

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Description
  • Článek se zabývá oxidací Cu, Zr, ZrCu, ZrO2 a Zr-Cu-O vrstev během podepozičního žíhání v proudícím vzduchu. Vrstvy byly nadeponovány s použitím nevyváženého dc magnetronu z čistých nebo skládaných terčů v Ar nebo ve směsi Ar+O2. Oxidační chování vrstev bylo charakterizováno pomocí vysokoteplotní termogravimetrie a XRD. Mechanické vlastnosti byly měřeny na mikrotvrdoměru Fischerscope H100. Tepelné žíhání bylo provedeno v širokém rozsahu od 300 do 1300 °C. Zvláštní pozornost byla věnována oxidaci Cu a efektu obsahu Cu v Zr-Cu-O vrstvách na jejich oxidační odolnost. Bylo ukázáno, že přeměna Cu <-> Cu2O při ~1040 °C je vratný proces. (cs)
  • The article deals with oxidation of Cu,Zr,ZrCu,ZrO2, and Zr-Cu-O films during post-deposition thermal annealing in flowing air. The films were deposited using dc unbalanced magnetron from pure or composed target in Ar or an Ar+O2 mixture. The oxidation behavior of the films was characterized by high-temperature thermogravimetry and XRD. Mechanical properties were measured by a microindenter Fischerscope H100. Thermal annealing was carried out over a wide range from 300 to 1300°C. Special attention was devoted to the oxidation of Cu and to the effect of Cu content in Zr-Cu-O films on the oxidation resistance. It was shown that the conversation CuO-Cu2 at 1040°C is a reversible process.
  • The article deals with oxidation of Cu,Zr,ZrCu,ZrO2, and Zr-Cu-O films during post-deposition thermal annealing in flowing air. The films were deposited using dc unbalanced magnetron from pure or composed target in Ar or an Ar+O2 mixture. The oxidation behavior of the films was characterized by high-temperature thermogravimetry and XRD. Mechanical properties were measured by a microindenter Fischerscope H100. Thermal annealing was carried out over a wide range from 300 to 1300°C. Special attention was devoted to the oxidation of Cu and to the effect of Cu content in Zr-Cu-O films on the oxidation resistance. It was shown that the conversation CuO-Cu2 at 1040°C is a reversible process. (en)
Title
  • Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air
  • Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air (en)
  • Oxidace naprašovaných Cu, Zr, ZrCu, ZrO2 a Zr-Cu-O vrstev během tepelného (cs)
skos:prefLabel
  • Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air
  • Oxidation of Sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O Films during Thermal Annealing in Flowing Air (en)
  • Oxidace naprašovaných Cu, Zr, ZrCu, ZrO2 a Zr-Cu-O vrstev během tepelného (cs)
skos:notation
  • RIV/49777513:23520/07:00000105!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 0
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 440386
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/07:00000105
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • films; magnetron sputtering; oxidation resistance; thermogravimetry; ZrO2 films; Zr-Cu-O films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [4BB4D7DAD794]
http://linked.open...i/riv/nazevZdroje
  • Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Zeman, Petr
  • Čerstvý, Radomír
  • Šašek, Martin
  • Jirout, Michal
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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