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| Description
| - Several sets of nanocrystalline and amorphous TiO2 thin films magnetron deposited on glass and Si substrates have been studied. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics; the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. A set of amorphous films with different thickness was studied after annealing and also by in-situ measurements during the heating. It was found that the crystallization temperature started at about 250 °C for thicker films but it was higher for thinner films (< 200 nm) and reached about 350 °C. Thinner films were single phase (anatase) while thicker films above 1200 nm contained also a small amount of nanocrystalline rutile. The crystallite size of these samples immediately after crystallization was larger than 100 nm.
- Several sets of nanocrystalline and amorphous TiO2 thin films magnetron deposited on glass and Si substrates have been studied. Phase analysis and X-ray line broadening were studied by X-ray powder diffraction in parallel beam optics; the residual stresses were measured with the aid of the Eulerian cradle and surface roughness determined by X-ray reflectivity measurement. A set of amorphous films with different thickness was studied after annealing and also by in-situ measurements during the heating. It was found that the crystallization temperature started at about 250 °C for thicker films but it was higher for thinner films (< 200 nm) and reached about 350 °C. Thinner films were single phase (anatase) while thicker films above 1200 nm contained also a small amount of nanocrystalline rutile. The crystallite size of these samples immediately after crystallization was larger than 100 nm. (en)
- Byly studovány vlastnosti tenkých amorfních vrstev TiO2 připravených na skleněné a Si substráty. In-situ a ex-situ XRD analýza byla využita k sledování vlivu žíhání na vlastnosti vrstev. Bylo zjištěno, že pro vrstvy s h>200nm se krystalizační teplota pohybuje okolo 250°C. U vrstev s nižší tloušťkou je tato teplota vyšší (T=350°C). Tenké vrstvy přitom po krystalizaci vykazovaly pouze krystalovou strukturu anatáz. Pro vrstvy s h>1200nm byla po krystalizaci detekována i krystalová fáze rutil. Velikost krystalů se ihned po krystalizaci pohybovala nad 100nm. (cs)
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| Title
| - Magnetron deposited TiO2 thin films crystallization and temperature dependence of microstructure and phase composition
- Magnetron deposited TiO2 thin films crystallization and temperature dependence of microstructure and phase composition (en)
- Vliv teploty na mikrostrukturu, fázové složení a krystalizaci vrstev TiO2 připravených magnetronovým naprašováním (cs)
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| skos:prefLabel
| - Magnetron deposited TiO2 thin films crystallization and temperature dependence of microstructure and phase composition
- Magnetron deposited TiO2 thin films crystallization and temperature dependence of microstructure and phase composition (en)
- Vliv teploty na mikrostrukturu, fázové složení a krystalizaci vrstev TiO2 připravených magnetronovým naprašováním (cs)
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| skos:notation
| - RIV/49777513:23520/07:00000046!RIV08-MSM-23520___
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(GA106/06/0327), Z(MSM0021620834), Z(MSM4977751302)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/07:00000046
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - titanium oxide; thin film crystallization; anneling; in-situ X-ray diffraction (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...odStatuVydavatele
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
| - Materials Structure in Chemistry, Biology, Physics and Technology
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| http://linked.open...in/vavai/riv/obor
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| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
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| http://linked.open...vavai/riv/projekt
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| http://linked.open...UplatneniVysledku
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| http://linked.open...iv/tvurceVysledku
| - Musil, Jindřich
- Šícha, Jan
- Kužel, Radomír
- Nichtová, L.
- Matěj, Z.
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| http://linked.open...n/vavai/riv/zamer
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| issn
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| number of pages
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| http://localhost/t...ganizacniJednotka
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