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Description
  • Vrstvy Zr-Ni-N s nízkým obsahem Ni byly připraveny pomocí reaktivního magnetronového naprašování. Mezi jednotlivými depozicemi byl postupně zvyšován parciální tlak dusíku. Tento postup umožnil měnit preferenční orientaci zrn. Mezi vrstvami s různou preferenční krystalografickou orientací se nachází přechodová vrstva (TR). Vrstvy připravené uvnitř TR jsou charakterizovány rentgenově amorfní strukturou. Ukázalo se, že ačkoliv se vrstvy připravené uvnitř a vně TR značně liší svojí strukturou, vykazují oba typy zvýšenou tvrdost. (cs)
  • The Zr-Ni-N films with addition of small amount Ni were reactively sputtered using dc unbalanced magnetron. Between depositions the partial pressure of nitrogen in sputtering gas was continuously increased. This methodology makes it possible to change the preferred orientation of grains. Between the films with different prefered crystallographic orientation there is a transition region (TR). The films produced inside TR are characterized by X-ray amorphous structure. Experiments have shown in spite of the fact that the films produced inside TR and outside of it strongly differ in their structure, both kinds of films exhibit an enhanced hardness.
  • The Zr-Ni-N films with addition of small amount Ni were reactively sputtered using dc unbalanced magnetron. Between depositions the partial pressure of nitrogen in sputtering gas was continuously increased. This methodology makes it possible to change the preferred orientation of grains. Between the films with different prefered crystallographic orientation there is a transition region (TR). The films produced inside TR are characterized by X-ray amorphous structure. Experiments have shown in spite of the fact that the films produced inside TR and outside of it strongly differ in their structure, both kinds of films exhibit an enhanced hardness. (en)
Title
  • Enhanced hardness in sputtered Zr-Ni-N films
  • Enhanced hardness in sputtered Zr-Ni-N films (en)
  • Zvýšená tvrdost v naprašovaných vrstvách Zr-Ni-N (cs)
skos:prefLabel
  • Enhanced hardness in sputtered Zr-Ni-N films
  • Enhanced hardness in sputtered Zr-Ni-N films (en)
  • Zvýšená tvrdost v naprašovaných vrstvách Zr-Ni-N (cs)
skos:notation
  • RIV/49777513:23520/06:00000365!RIV07-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 6293
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ME 673), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 474222
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/06:00000365
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • nanocomposite films; enhanced hardness; structure; microstructure; mechanical properties (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [528CD9C5CBA5]
http://linked.open...i/riv/nazevZdroje
  • Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Ondok, Václav
  • Šůna, Jan
  • Han, J. G.
http://linked.open...n/vavai/riv/zamer
issn
  • 0257-8972
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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