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  • We report on the results of measurement of the temperature TFsurf which developed on the surface of films deposited by magnetron sputtering of chromium and copper targets on cooling and non-cooling silicon substrates. The TFsurf and substrate temperature (TS) were simultaneously measured using high-resolution IR camera and thermocouple, respectively. We revealed that the TFsurf steeply grows, keeps constant when it achieves saturation level, and rapidly drops to the value of the TS after stopping the deposition. At the same time, the TS either does not change for the case of cooling substrate or increases to a certain level for non-cooling substrate. However, in both cases the TS remains several times lower than the TFsurf. The TFsurf is proportional to the flux of energy delivered to the growth surface by sputtered atoms and other fast particles, weakly depends on the depositing metal and can achieve several hundreds of °C.
  • We report on the results of measurement of the temperature TFsurf which developed on the surface of films deposited by magnetron sputtering of chromium and copper targets on cooling and non-cooling silicon substrates. The TFsurf and substrate temperature (TS) were simultaneously measured using high-resolution IR camera and thermocouple, respectively. We revealed that the TFsurf steeply grows, keeps constant when it achieves saturation level, and rapidly drops to the value of the TS after stopping the deposition. At the same time, the TS either does not change for the case of cooling substrate or increases to a certain level for non-cooling substrate. However, in both cases the TS remains several times lower than the TFsurf. The TFsurf is proportional to the flux of energy delivered to the growth surface by sputtered atoms and other fast particles, weakly depends on the depositing metal and can achieve several hundreds of °C. (en)
  • Tento článek pojednává o výsledcích měření povrchové teploty TFsurf, která vzniká na povrchu tenké vrstvy deponované magnetronovým naprašováním chromových a měděných terčů na chlazené a nechlazené křemíkové substráty. Teplota TFsurf a teplota substrátu (TS) byly simultánně měřeny IR kamerou s vysokým rozlišením a zároveň termočlánkem. Bylo zjištěno, že TFsurf prudce roste, dosahuje konstantních hodnot při dosažení saturační meze a prudce klesá na hodnotu TS po vypnutí depozice. Současně, TS se nemění v případě použití chlazeného substrátu nebo roste na určitou hodnotu v případě použití nechlazeného substrátu. Přesto ovšem TS dosahuje hodn (cs)
Title
  • Evolution of film temperature during magnetron sputtering
  • Vývoj teploty tenké vrstvy během magnetronového naprašování (cs)
  • Evolution of film temperature during magnetron sputtering (en)
skos:prefLabel
  • Evolution of film temperature during magnetron sputtering
  • Vývoj teploty tenké vrstvy během magnetronového naprašování (cs)
  • Evolution of film temperature during magnetron sputtering (en)
skos:notation
  • RIV/49777513:23520/06:00000130!RIV07-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 1083
http://linked.open...avai/riv/aktivita
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  • Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 474835
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/06:00000130
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • substrate temperature; surface of the film temperature; magnetron sputtering; temperature measurement (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [A0D0E4A1E47C]
http://linked.open...i/riv/nazevZdroje
  • Journal of Vacuum Science and Technology A
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Shaginyan, L. R.
  • Han, J. G.
  • Shaginyan, V. R.
http://linked.open...n/vavai/riv/zamer
issn
  • 0734-2101
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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