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Description
  • TiC/Cu nanocomposite films with various copper content were deposited by DC unbalanced magnetron sputtering from sintered TiC target fixed by Cu rings of different inner diameters in pure argon. This makes it possible to prepare TiC/Cu films with Cu content ranging from approximately 5 to 85 at% Cu. The structure and mechanical properties were examined as a function of deposition parameters and Cu content in the film. Special attention is devoted to the total internal stress, parameters determining its magnitude and their correlation with mechanical properties. The TiC/Cu system is compared with similar nitride MeNx/Cu(Ni) (Me=Ti,Zr) systems and explanation of the different behavior of nitride and carbide systems is proposed.
  • TiC/Cu nanocomposite films with various copper content were deposited by DC unbalanced magnetron sputtering from sintered TiC target fixed by Cu rings of different inner diameters in pure argon. This makes it possible to prepare TiC/Cu films with Cu content ranging from approximately 5 to 85 at% Cu. The structure and mechanical properties were examined as a function of deposition parameters and Cu content in the film. Special attention is devoted to the total internal stress, parameters determining its magnitude and their correlation with mechanical properties. The TiC/Cu system is compared with similar nitride MeNx/Cu(Ni) (Me=Ti,Zr) systems and explanation of the different behavior of nitride and carbide systems is proposed. (en)
  • Za pomoci dc nevyváženého magnetronu byly v argonu nadeponovány nanokompozitní TiC/Cu vrstvy z TiC terče upevněného měděným kroužkem o proměnném průměru. To umožnilo připravit vrstvy s obsahem mědi od cca 4 do 80 at.%. Byly vyšetřeny korelace mezi strukturou (charakterizovanou pomocí XRD, Raman, SEM analýz) a mechanickými vlatnostmi na jedné straně a použitými depozičními parametry spolu s obsahem mědi ve vrstvách na straně druhé. Speciální úsilí bylo věnováno celkovému pnutí, parametrům předurčujícím jeho velikost a vazbu pnutí s mechanickými vlastnostmi. Vytvořený TiC/Cu systém je porovnán s obdobnými MeNx/Cu(Ni), (Me=Ti,Zr) systémy, přičemž bylo navrženo vysvětlení rozdílného chován (cs)
Title
  • Structure and mechanical properties of DC magnetron sputtered Ti/Cu films
  • Struktura a mechanické vlastnosti vrstev TiC/Cu připravených DC magnetronovým naprašováním (cs)
  • Structure and mechanical properties of DC magnetron sputtered Ti/Cu films (en)
skos:prefLabel
  • Structure and mechanical properties of DC magnetron sputtered Ti/Cu films
  • Struktura a mechanické vlastnosti vrstev TiC/Cu připravených DC magnetronovým naprašováním (cs)
  • Structure and mechanical properties of DC magnetron sputtered Ti/Cu films (en)
skos:notation
  • RIV/49777513:23520/06:00000087!RIV07-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 531
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
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http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 501963
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/06:00000087
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • TiC-Cu films; mechanical properties; stress; structure (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [84BB142E9DF9]
http://linked.open...i/riv/nazevZdroje
  • Vacuum
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Soldán, Jan
http://linked.open...n/vavai/riv/zamer
issn
  • 0042-207X
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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