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Description
  • Vysokoteplotní oxidační odolnost vrstev Ta-Si-N s vysokým obsahem Si připravených reaktivním magnetronovým naprašováním byla studována pomocí vysokorozlišovací termogravimetrie v proudícím vzduchu do teploty 1300°C. Výsledky ukázaly výbornou oxidační odolnost vrstev až do 1300°C. Neptrná oxiadce je spojena s vytvořením tenké povrchové vrstvy bránící další oxidaci objemu vrstvy. (cs)
  • The high-temperature oxidation resistance of ternary Ta-Si-N films with a high Si content deposited by reactive dc magnetron sputtering on silicon substrates was systematically investigated by means of a symmetrical high-resolution thermogravimetry in a flowing air up to an annealing temperature of 1300°C. Additional analyses including optical microscopy, scanning electron microscopy, X-ray diffraction and the microhardness measurement were carried out as well
  • The high-temperature oxidation resistance of ternary Ta-Si-N films with a high Si content deposited by reactive dc magnetron sputtering on silicon substrates was systematically investigated by means of a symmetrical high-resolution thermogravimetry in a flowing air up to an annealing temperature of 1300°C. Additional analyses including optical microscopy, scanning electron microscopy, X-ray diffraction and the microhardness measurement were carried out as well (en)
Title
  • High-temperature oxidation resistance of Ta-Si-N films with a high Si content
  • High-temperature oxidation resistance of Ta-Si-N films with a high Si content (en)
  • Vysokoteplotní oxidační odolnost vrstev Ta-Si-N s vysokým obsahem Si (cs)
skos:prefLabel
  • High-temperature oxidation resistance of Ta-Si-N films with a high Si content
  • High-temperature oxidation resistance of Ta-Si-N films with a high Si content (en)
  • Vysokoteplotní oxidační odolnost vrstev Ta-Si-N s vysokým obsahem Si (cs)
skos:notation
  • RIV/49777513:23520/06:00000087!RIV07-GA0-23520___
http://linked.open.../vavai/riv/strany
  • 4091
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GP106/03/D009), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 477730
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/06:00000087
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Ta-Si-N films; oxidation resistance; thermogravimetry; sputtering (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [4448E739A641]
http://linked.open...i/riv/nazevZdroje
  • Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Zeman, Petr
  • Daniel, Rostislav
http://linked.open...n/vavai/riv/zamer
issn
  • 0257-8972
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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